Device and method for manipulation and routing of a metrology beam

• US 7,177,059 B2
• Filed: 03/05/2004
• Issued: 02/13/2007
• Est. Priority Date: 03/06/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van Der Pasch, Engelbertus Antonius Fransiscus, Beems, Marcel Hendrikus Maria, Eussen, Emiel Jozef Melanie, Klijntunte, Engelbertus Johannes Jeroen
• Primary Examiner(s): Cherry; Euncha P.
• Application Number:
  US10/793,420
• Publication Number:
  US 20040233494A1
• Time in Patent Office: 1,075 Days
• Field of Search: 359/196, 359/209, 359211-212, 359/223, 359/226, 359833-834
• US Class Current: 359/211.2
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position

Abstract

A lithographic projection apparatus is equipped with a device for manipulation and routing of at least one portion of a metrology beam of radiation. The device includes a first and a second optical wedge, wherein the second optical wedge and the first optical wedge having a relative position with respect to each other. The at least one portion of the metrology beam enters the device along an incoming optical axis at a first major surface of the first optical wedge, passes through the first and second optical wedges, and exits at a second major surface of the second optical wedge. The first and second optical wedges are arranged to at least one of rotate and translate the at least one portion of the metrology beam relative to the incoming optical axis by changing the relative position of the first and the second optical wedges.

Claims

1. A lithographic apparatus, comprising:

an interferometric system including a radiation source that generates a metrology beam;

a first optical wedge;

a second optical wedge, said first and second optical wedges having a relative position with respect to each other, wherein the first and second optical wedges are configured to rotate around a rotation axis that is perpendicular to an optical axis;

wherein at least a portion of said metrology beam propagates along an incoming optical axis at a first major surface of said first optical wedge, passes through said first and second optical wedges, and exits at a second major surface of said second optical wedge, and

wherein said first and second optical wedges are configured to perform at least one of a rotation and a translation of at least the portion of said metrology beam relative to said incoming optical axis by changing said relative position of said first and second optical wedges.

2. The lithographic apparatus of claim 1, wherein at least one of said first and second optical wedges are rotated over an axial angle around said optical axis.

3. The lithographic apparatus of claim 2, wherein at least one of said first and second optical wedges are displaced along said optical axis to change a distance between them.

4. The lithographic apparatus of claim 3, wherein said first and second optical wedges have a fixed relative position with a fixed axial angle and fixed distance, and said first and second optical wedges are rotated in combination around said optical axis.

5. The lithographic apparatus of claim 4, wherein said first and second optical wedges have the fixed relative position with the fixed axial angle and fixed distance, and said first and second optical wedges are rotated in combination around a rotating axis normal to said optical axis.

6. A lithographic apparatus, comprising:

an interferometric system including a radiation source that generates a metrology beam;

a first optical wedge;

a second optical wedge in which one of a first and second major surface of said second optical wedge is provided with a reflective coating, said first and second optical wedges having a relative position with respect to each other, wherein the first and second optical wedges are configured to rotate around a rotation axis that is perpendicular to an optical axis;

wherein at least one portion of said metrology beam propagates along an incoming optical axis at a first major surface of said first optical wedge, passes through said first optical wedge, and reflects from said one of said first and second major surfaces of said second optical wedge, and

wherein said first and second optical wedges are configured to perform at least one of rotation and a translation of said at least portion of said metrology beam relative to said incoming optical axis by changing said relative position of said first and said second optical wedges.

7. The lithographic apparatus of claim 6, wherein at least one of said first and second optical wedges are rotated over an axial angle around said optical axis.

8. The lithographic apparatus of claim 6, wherein said second optical wedge is rotated over an angle around a rotation axis that is substantially perpendicular to said first major surface of said second optical wedge.

9. The lithographic apparatus of claim 8, wherein at least one of said first and second optical wedges are displaced along said optical axis to change a distance between them.

10. The lithographic apparatus of claim 9, wherein said first and second optical wedges have a fixed relative position with a fixed axial angle and fixed distance, and said first and second optical wedges are rotated in combination around said optical axis.

11. The lithographic apparatus of claim 10, wherein said first and second optical wedges have the fixed relative position with the fixed axial angle and fixed distance, and said first and second optical wedges are rotated in combination around a rotating axis normal to said optical axis.

12. A device for manipulating and routing at least a portion of a metrology beam of an interferometer system, comprising:

a first optical wedge;

a second optical wedge, said second optical wedge and said first optical wedge having a relative position with respect to each other, wherein the first and second optical wedges are configured to rotate around a rotation axis that is perpendicular to an optical axis;

wherein said at least one portion of said metrology beam enters said device along an incoming optical axis at a first major surface of said first optical wedge, passes through said first optical wedge and said second optical wedge, and exits at a second major surface of said second optical wedge, and

wherein said first and second optical wedges are configured to perform to at least one of rotation and a translation of said at least one portion of said metrology beam relative to said incoming optical axis by changing said relative position of said first and said second optical wedges.

13. A device for manipulating and routing at least a portion of a metrology beam of an interferometer system, said device comprising:

a first optical wedge,

a second optical wedge in which one of a first and second major surface of said second optical wedge is provided with a reflective coating, said second optical wedge and said first optical wedge having a relative position with respect to each other, wherein the first and second optical wedges are configured to rotate around a rotation axis that is perpendicular to an optical axis;

wherein said at least one portion of said metrology beam enters said device along an incoming optical axis at a first major surface of said first optical wedge, passes through said first optical wedge, and reflects from said one of said first and second major surfaces of said second optical wedge, and

wherein said first and second optical wedges are configured to perform at least one of rotation and a translation of said at least one portion of said metrology beam relative to said incoming optical axis by changing said relative position of said first and said second optical wedges.

14. A device manufacturing method, comprising:

radiating an interferometric metrology beam, at least one portion of said metrology beam entering a first major surface of a first optical wedge along an incoming optical axis;

passing said at least one portion of said metrology beam through said first optical wedge and through a second optical wedge, said second optical wedge and said first optical wedge having a relative position with respect to each other;

enabling the first and second optical wedges to rotate around a rotation axis that is perpendicular to the incoming optical axis;

exiting said at least one portion of said metrology beam at a second major surface of said second optical wedge; and

performing at least one of rotation and translation of said at least one portion of said metrology beam relative to said incoming optical axis by changing said relative position of said first and said second optical wedges.

15. A device manufacturing method, comprising:

radiating an interferometric metrology beam, at least one portion of said metrology beam entering a first major surface of a first optical wedge along an incoming optical axis;

passing said at least one portion of said metrology beam through said first optical wedge;

reflecting said at least one portion of said metrology beam at one of a first and second major surface of said second optical wedge, said second optical wedge and said first optical wedge having a relative position with respect to each other;

enabling the first and second optical wedges to rotate around a rotation axis that is perpendicular to the incoming optical axis; and

performing at least one of rotation and translation of said at least one portion of said metrology beam relative to said incoming optical axis by changing said relative position of said first and said second optical wedges.