Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic apparatus, comprising:
- an illumination system that supplies a projection beam of radiation;
patterning device for imparting the projection beam with a pattern in its cross-section;
second patterning device for imparting a second beam of radiation supplied by the illumination system with a second pattern;
a substrate table that supports a substrate;
a projection system that projects the patterned beams onto a target portion of the substrate; and
a radiation distribution device that distributes the radiation from the illumination system to the patterning device;
wherein the radiation distribution device has a duty cycle during which it sequentially directs a respective portion of the radiation from the illumination system to each of a plurality of radiation distribution channels in turn, and wherein the radiation distribution channels provide the beams of radiation to the patterning device.
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Abstract
Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
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Citations
28 Claims
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1. A lithographic apparatus, comprising:
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an illumination system that supplies a projection beam of radiation; patterning device for imparting the projection beam with a pattern in its cross-section; second patterning device for imparting a second beam of radiation supplied by the illumination system with a second pattern; a substrate table that supports a substrate; a projection system that projects the patterned beams onto a target portion of the substrate; and a radiation distribution device that distributes the radiation from the illumination system to the patterning device; wherein the radiation distribution device has a duty cycle during which it sequentially directs a respective portion of the radiation from the illumination system to each of a plurality of radiation distribution channels in turn, and wherein the radiation distribution channels provide the beams of radiation to the patterning device. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A lithographic apparatus comprising:
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an illumination system that supplies a projection beam of radiation; a patterning device for imparting the projection beam with a pattern in its cross-section; a second patterning device for imparting a second beam of radiation supplied by the illumination system with a second pattern; a substrate table that supports a substrate; a projection system that projects the patterned beams onto a target portion of the substrate; and a radiation distribution device that distributes the radiation from the illumination system to the patterning device, wherein the radiation distribution device includes a beam divider that divides the beam of radiation from the illumination system into a plurality of portions, each of which is directed to a distribution channel, and wherein the radiation distribution channels provide the beams of radiation to the patterning devices and the beam divider comprises a plurality of partially reflective surfaces through which the beam of radiation from the illumination system is successively directed in accordance with a distribution device duty cycle, each said partially reflective surface associated with one of the radiation distribution channels and reflecting a portion of the beam of radiation to said radiation distribution channel. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
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28. A device manufacturing method comprising the steps of:
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providing a projection beam of radiation using an illumination system; using a patterning device to impart the projection beam with a pattern in its cross-section; using a second patterning device to impart a second projection beam of radiation supplied by the illumination system with a second pattern in its cross-section; projecting the patterned beams onto a target portion of a substrate; and using a radiation distribution device to distribute the radiation from the illumination system to the patterning devices, wherein the radiation distribution device has a duty cycle during which it sequentially directs a respective portion of the radiation from the illumination system to each of a plurality of radiation distribution channels in turn, wherein the radiation distribution channels provide the beams of radiation to the patterning devices.
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Specification