Thin-film battery having ultra-thin electrolyte and associated method

• US 7,194,801 B2
• Filed: 03/23/2001
• Issued: 03/27/2007
• Est. Priority Date: 03/24/2000
• Status: Expired due to Fees

• Current Assignee: Cymbet Corporation
• Original Assignee: Cymbet Corporation
• Inventors: Jenson, Mark Lynn, Weiss, Victor Henry
• Primary Examiner(s): Bell; Bruce F.
• Application Number:
  US09/815,983
• Publication Number:
  US 20020001747A1
• Time in Patent Office: 2,195 Days
• Field of Search: 429/204, 429/302, 429/450, 429/86, 429/231.8, 429/300, 429/162, 429/124, 429/126, 429/231.95, 297/30, 296/231, 296/234, 296/235, 117/92, 117/117, 117/902, 118/715, 118/720, 118/723.FE, 118/723.FI
• US Class Current: 29/730
• CPC Class Codes: A61N 1/3787 from an external energy source
• CPC Class Codes: C23C 14/0031 Bombardment of substrates by reactive ion beams
• CPC Class Codes: C23C 14/0676 Oxynitrides
• CPC Class Codes: C23C 14/08 Oxides C23C14/10 takes precedence
• CPC Class Codes: C23C 16/047 using irradiation by energy or particles
• CPC Class Codes: G02F 1/13306 Circuit arrangements or driving methods for the control of single liquid crystal cells G02F1/132, G02F1/133382 take precedence
• CPC Class Codes: G02F 1/13324 Circuits comprising solar cells
• CPC Class Codes: H01G 11/08 Structural combinations, e.g. assembly or connection, of hybrid or EDL capacitors with other electric components, at least one hybrid or EDL capacitor being the main component
• CPC Class Codes: H01G 11/26 characterised by their structure, e.g. multi-layered, porosity or surface features
• CPC Class Codes: H01G 11/56 Solid electrolytes, e.g. gels; Additives therein
• CPC Class Codes: H01L 2224/16225 the item being non-metallic, e.g. insulating substrate with or without metallisation
• CPC Class Codes: H01L 2224/48091 Arched
• CPC Class Codes: H01L 2224/49109 outside the semiconductor or solid-state body
• CPC Class Codes: H01L 23/58 Structural electrical arrangements for semiconductor devices not otherwise provided for , e.g. in combination with batteries H01L23/49593, H01L23/49596 take precedence
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/00014 the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
• CPC Class Codes: H01L 2924/09701 Low temperature co-fired ceramic [LTCC]
• CPC Class Codes: H01L 2924/10253 Silicon [Si]
• CPC Class Codes: H01L 2924/12044 OLED
• CPC Class Codes: H01L 31/073 comprising only AIIBVI compound semiconductors, e.g. CdS/CdTe solar cells
• CPC Class Codes: H01L 31/1828 : the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe
• CPC Class Codes: H01M 10/0436 : Small-sized flat cells or batteries for portable equipment
• CPC Class Codes: H01M 10/0472 : Vertically superposed cells with vertically disposed plates
• CPC Class Codes: H01M 10/052 : Li-accumulators
• CPC Class Codes: H01M 10/0525 : Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
• CPC Class Codes: H01M 10/0562 : Solid materials
• CPC Class Codes: H01M 10/058 : Construction or manufacture
• CPC Class Codes: H01M 10/0585 : of accumulators having only flat construction elements, i.e. flat positive electrodes, flat negative electrodes and flat separators
• CPC Class Codes: H01M 10/42 : Methods or arrangements for servicing or maintenance of secondary cells or secondary half-cells H01M10/60 takes precedence
• CPC Class Codes: H01M 10/425 : Structural combination with electronic components, e.g. electronic circuits integrated to the outside of the casing printed circuits H05K1/00
• CPC Class Codes: H01M 10/4257 : Smart batteries, e.g. electronic circuits inside the housing of the cells or batteries
• CPC Class Codes: H01M 10/4264 : with capacitors
• CPC Class Codes: H01M 10/44 : Methods for charging or discharging circuits for charging H02J7/00
• CPC Class Codes: H01M 10/46 : Accumulators structurally combined with charging apparatus circuits for charging H02J7/00
• CPC Class Codes: H01M 10/465 : with solar battery as charging system
• CPC Class Codes: H01M 14/00 : Electrochemical current or voltage generators not provided for in groups H01M6/00 - H01M12/00; Manufacture thereof
• CPC Class Codes: H01M 14/005 : Photoelectrochemical storage cells light sensitive devices H01G9/20, semiconductors sensitive to light H01L31/00
• CPC Class Codes: H01M 2004/021 : Physical characteristics, e.g. porosity, surface area
• CPC Class Codes: H01M 2008/1293 : Fuel cells with solid oxide electrolytes
• CPC Class Codes: H01M 4/0421 : involving vapour deposition
• CPC Class Codes: H01M 4/0423 : Physical vapour deposition
• CPC Class Codes: H01M 4/0426 : Sputtering
• CPC Class Codes: H01M 4/1391 : of electrodes based on mixed oxides or hydroxides, or on mixtures of oxides or hydroxides, e.g. LiCoOx
• CPC Class Codes: H01M 4/1393 : of electrodes based on carbonaceous material, e.g. graphite-intercalation compounds or CFx
• CPC Class Codes: H01M 4/1397 : of electrodes based on inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFy
• CPC Class Codes: H01M 4/382 : Lithium H01M4/405 takes precedence
• CPC Class Codes: H01M 4/405 : Alloys based on lithium
• CPC Class Codes: H01M 4/483 : for non-aqueous cells H01M4/485 takes precedence
• CPC Class Codes: H01M 4/581 : Chalcogenides or intercalation compounds thereof
• CPC Class Codes: H01M 4/5825 : Oxygenated metallic salts or polyanionic structures, e.g. borates, phosphates, silicates, olivines
• CPC Class Codes: H01M 4/587 : for inserting or intercalating light metals
• CPC Class Codes: H01M 4/8885 : Sintering or firing
• CPC Class Codes: H01M 4/9016 : Oxides, hydroxides or oxygenated metallic salts
• CPC Class Codes: H01M 50/103 : prismatic or rectangular H01M50/109, H01M50/11 take precedence
• CPC Class Codes: H01M 50/209 : adapted for prismatic or rectangular cells H01M50/216 takes precedence
• CPC Class Codes: H01M 50/403 : Manufacturing processes of separators, membranes or diaphragms
• CPC Class Codes: H01M 6/185 : with oxides, hydroxides or oxysalts as solid electrolytes
• CPC Class Codes: H01M 6/186 : Only oxysalts-containing solid electrolytes
• CPC Class Codes: H01M 6/188 : Processes of manufacture
• CPC Class Codes: H01M 6/40 : Printed batteries , e.g. thin film batteries
• CPC Class Codes: H01M 6/42 : Grouping of primary cells into batteries H01M6/40 takes precedence
• CPC Class Codes: H01M 8/1007 : with both reactants being gaseous or vaporised H01M8/12 takes precedence
• CPC Class Codes: H01M 8/1286 : Fuel cells applied on a support, e.g. miniature fuel cells deposited on silica supports
• CPC Class Codes: H04M 1/0262 : for a battery compartment
• CPC Class Codes: H05K 1/16 : incorporating printed electric components, e.g. printed resistor, capacitor, inductor
• CPC Class Codes: Y02E 10/543 : Solar cells from Group II-VI materials
• CPC Class Codes: Y02E 60/10 : Energy storage using batteries
• CPC Class Codes: Y02E 60/13 : Energy storage using capacitors
• CPC Class Codes: Y02E 60/50 : Fuel cells
• CPC Class Codes: Y02P 70/50 : Manufacturing or production processes characterised by the final manufactured product
• CPC Class Codes: Y10S 117/902 : Specified orientation, shape, crystallography, or size of seed or substrate
• CPC Class Codes: Y10T 29/49108 : Electric battery cell making
• CPC Class Codes: Y10T 29/49114 : including adhesively bonding
• CPC Class Codes: Y10T 29/49115 : including coating or impregnating
• CPC Class Codes: Y10T 29/4913 : Assembling to base an electrical component, e.g., capacitor, etc.
• CPC Class Codes: Y10T 29/5313 : Means to assemble electrical device
• CPC Class Codes: Y10T 29/53135 : Storage cell or battery

Abstract

A method and system for fabricating solid-state energy-storage devices including fabrication films for devices without an anneal step. A film of an energy-storage device is fabricated by depositing a first material layer to a location on a substrate. Energy is supplied directly to the material forming the film. The energy can be in the form of energized ions of a second material. Supplying energy directly to the material and/or the film being deposited assists in controlling the growth and stoichiometry of the film. The method allows for the fabrication of ultrathin films such as electrolyte films and dielectric films.

Claims

1. A method of fabricating a thin-film battery, comprising:

providing a substrate;

forming an electrode first film on the substrate;

forming an electrolyte second film electrolyte on the first film, wherein the electrolyte second film blocks the flow of electrons while permitting the flow of ions, and wherein forming the electrolyte second film includes;

depositing electrolyte material using a deposition source; and

supplying energized particles from a second source such that the particles provide energy to the electrolyte material to deposit the electrolyte material into a desired film structure; and

forming an electrode third film on the second film,

wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than 1000 Angstroms.

2. The method of claim 1, wherein supplying energized particles includes supplying ions having an energy of greater than about 5 eV.

3. The method of claim 1, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

4. The method of claim 1, wherein supplying energized particles includes supplying ions having an energy of less than about 3000 eV.

5. The method of claim 4, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

6. The method of claim 1, wherein supplying energized particles includes supplying ions having an energy in the range of about 5 eV to about 500 eV.

7. The method of claim 6, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

8. The method of claim 1, wherein supplying energized particles includes supplying ions having an energy in the range of about 5 eV to about 250 eV.

9. The method of claim 8, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

10. The method of claim 1, wherein supplying energized particles includes supplying ions having an energy in the range of about 0 eV to about 40 eV.

11. The method of claim 10, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

12. The method of claim 1, wherein depositing electrolyte material includes depositing Li₃PO₄ electrolyte material.

13. The method of claim 12, wherein supplying energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the Li₃PO₄ electrolyte material.

14. The method of claim 13, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

15. The method of claim 12, wherein forming the electrolyte second film includes providing a nitrogen-enriched atmosphere in which the Li₃PO₄ electrolyte material is deposited.

16. The method of claim 15, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

17. The method of claim 12, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

18. The method of claim 1, wherein forming the electrolyte film includes forming the electrolyte film to a thickness sufficient to insulate the electrode first film from the electrode second film and to allow ion transport between the electrode first film and the electrode second film.

19. The method of claim 18, wherein forming the electrode first film includes depositing at least one of a metal and an intercalation material.

20. The method of claim 19, wherein forming the electrode third film includes depositing at least one of a metal and an intercalation material.

21. The method of claim 20, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

22. The method of claim 19, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

23. The method of claim 18, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

24. The method of claim 1, wherein forming the electrolyte second film includes forming the electrolyte film to a thickness in a range of about 1 nanometer to about 250 nanometers.

25. The method of claim 24, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

26. The method of claim 1, wherein the supplying energized particles includes supplying ions having an energy in the range of about 10 eV to about 500 eV.

27. The method of claim 1, wherein the supplying energized particles includes supplying ions having an energy in the range of about 10 eV to about 400 eV.

28. The method of claim 1, wherein the supplying energized particles includes supplying ions having an energy in the range of about 10 eV to about 300 eV.

29. The method of claim 1, wherein the supplying energized particles includes supplying ions having an energy in the range of about 10 eV to about 250 eV.

30. The method of claim 1, wherein the supplying energized particles includes supplying ions having an energy in the range of about 10 eV to about 200 eV.

31. The method of claim 30, wherein depositing electrolyte material includes depositing Li₃PO₄ electrolyte material.

32. The method of claim 1, wherein the supplying energized particles includes supplying ions having an energy in the range of about 10 eV to about 150 eV.

33. The method of claim 1, wherein the supplying energized particles includes supplying ions having an energy in the range of about 10 eV to about 100 eV.

34. The method of claim 1, wherein the supplying energized particles includes supplying ions having an energy in the range of about 20 eV to about 300 eV.

35. The method of claim 1, wherein the supplying energized particles includes supplying ions having an energy in the range of about 20 eV to about 250 eV.

36. The method of claim 1, wherein the supplying energized particles includes supplying ions having an energy in the range of about 20 eV to about 200 eV.

37. The method of claim 1, wherein the supplying energized particles includes supplying ions having an energy in the range of about 20 eV to about 150 eV.

38. The method of claim 1, wherein the supplying energized particles includes supplying ions having an energy in the range of about 20 eV to about 100 eV.

39. The method of claim 1, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than 500 Angstroms.

40. The method of claim 39, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

41. The method of claim 1, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than about 400 Angstroms.

42. The method of claim 1, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than about 300 Angstroms.

43. The method of claim 1, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than about 250 Angstroms.

44. The method of claim 43, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

45. The method of claim 1, wherein the forming of the electrode first film includes depositing an intercalation material.

46. The method of claim 45, wherein the forming of the electrode third film includes depositing a metal.

47. The method of claim 1, wherein the forming of the electrode first film includes depositing a metal.

48. The method of claim 47, wherein the forming of the electrode third film includes depositing an intercalation material.

49. The method of claim 1, wherein the supplying of energized particles includes supplying energized nitrogen particles and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

50. The method of claim 1, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

51. The method of claim 1, wherein the forming of the second film includes depositing lithium phosphorus oxynitride.

52. An apparatus comprising:

means for providing a substrate;

means for forming an electrode first film on the substrate;

means for forming an electrolyte second film on the first film, wherein the electrolyte second film blocks the flow of electrons while permitting the flow of ions, and wherein the means for forming the electrolyte second film includes;

means for depositing electrolyte material using a deposition source; and

means for supplying energized particles from a second source such that the particles provide energy to the electrolyte material to deposit the electrolyte material into a desired film structure; and

means for forming an electrode third film on the second film, wherein the electrolyte second film is deposited to a thickness of less than about 1000 Angstroms.

53. The apparatus of claim 52, wherein the electrolyte second film is lithium phosphorus oxynitride.

54. The apparatus of claim 52, wherein the electrolyte second film is deposited to a thickness in a range of about 10 Angstroms and about 200 Angstroms.

55. The apparatus of claim 52, wherein the electrolyte second film is deposited to a thickness in a range of about 10 Angstroms and about 50 Angstroms.

56. The apparatus of claim 52, wherein the means for supplying of energized particles supplies energized nitrogen particles, and the nitrogen particles react with the electrolyte material to form lithium phosphorus oxynitride.

93. The method of claim 52, wherein the electrolyte second film is lithium phosphorus oxynitride.

57. A method of fabricating a thin-film battery, comprising:

providing a substrate;

forming an electrode first film on the substrate;

forming an electrolyte second film electrolyte on the first film, wherein the electrolyte second film blocks the flow of electrons while permitting the flow of ions, and wherein forming the electrolyte second film includes;

depositing electrolyte material using a deposition source; and

supplying energized particles from a second source such that the particles provide energy to the electrolyte material to deposit the electrolyte material into a desired film structure; and

forming an electrode third film on the second film,

wherein the supplying energized particles includes supplying ions having an energy in the range of about 5 eV to about 50 eV, and

wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than 1000 Angstroms.

58. The method of claim 57, wherein the supplying energized particles includes supplying ions having an energy in the range of about 5 eV to about 30 eV.

59. The method of claim 58, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

60. The method of claim 57, wherein the supplying energized particles includes supplying ions having an energy in the range of about 5 eV to about 20 eV.

61. The method of claim 57, wherein the supplying energized particles includes supplying ions having an energy in the range of about 5 eV to about 20 eV.

62. The method of claim 57, wherein the supplying energized particles includes supplying ions having an energy in the range of about 10 eV to about 40 eV.

63. The method of claim 62, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

64. The method of claim 57, wherein the supplying energized particles includes supplying ions having an energy in the range of about 10 eV to about 30 eV.

65. The method of claim 57, wherein the supplying energized particles includes supplying ions having an energy in the range of about 10 eV to about 20 eV.

66. The method of claim 57, wherein the supplying energized particles includes supplying ions having an energy in the range of about 10 eV to about 20 eV.

67. The method of claim 57, wherein the supplying energized particles includes supplying ions having an energy in the range of about 20 eV to about 50 eV.

68. The method of claim 67, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

69. The method of claim 57, wherein the supplying energized particles includes supplying ions having an energy in the range of about 20 eV to about 40 eV.

70. The method of claim 57, wherein the supplying energized particles includes supplying ions having an energy in the range of about 20eV to about 30 eV.

71. The method of claim 57, wherein the supplying energized particles includes supplying ions having an energy in the range of about 20 eV.

72. The method of claim 57, wherein depositing electrolyte material includes depositing Li₃PO₄ electrolyte material.

73. The method of claim 57, wherein the forming of the second film includes depositing lithium phosphorus oxynitride.

74. A method of fabricating a thin-film battery, comprising:

providing a substrate;

forming an electrode first film on the substrate;

forming an electrolyte second film electrolyte on the first film, wherein the electrolyte second film blocks the flow of electrons while permitting the flow of ions, and wherein forming the electrolyte second film includes;

depositing electrolyte material using a deposition source; and

supplying energized particles from a second source such that the particles provide energy to the electrolyte material to deposit the electrolyte material into a desired film structure; and

forming an electrode third film on the second film,

wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than about 200 Angstroms.

75. The method of claim 74, wherein forming the electrolyte second film includes forming the electrolyte film to a thickness of less than about 100 Angstroms.

76. The method of claim 75, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

77. The method of claim 74, wherein forming the electrolyte second film includes forming the electrolyte film to a thickness in a range of about 10 Angstroms to about 200 Angstroms.

78. The method of claim 77, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

79. The method of claim 77, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

80. The method of claim 74, wherein forming the electrolyte second film includes forming the electrolyte film to a thickness in a range of about 10 Angstroms to about 100 Angstroms.

81. The method of claim 80, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

82. The method of claim 74, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than about 150 Angstroms.

83. The method of claim 74, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness in a range of about 10 Angstroms and about 50 Angstroms.

84. The method of claim 83, wherein the supplying of energized particles includes supplying energized nitrogen particles, and reacting the nitrogen particles with the electrolyte material to form lithium phosphorus oxynitride.

85. The method of claim 74, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than about 75 Angstroms.

86. The method of claim 74, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than about 50 Angstroms.

87. The method of claim 74, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than about 30 Angstroms.

88. The method of claim 74, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of about 20 Angstroms.

89. The method of claim 74, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of about 20 Angstroms.

90. The method of claim 74, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of about 10 Angstroms.

91. The method of claim 74, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness in a range of about 20 Angstroms and about 200 Angstroms.

92. The method of claim 74, wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of about 20 Angstroms and about 200 Angstroms.

94. The method of claim 74, wherein depositing electrolyte material includes depositing Li₃PO₄ electrolyte material.

95. A method of fabricating a thin-film battery, comprising:

providing a substrate;

forming an electrode first film on the substrate;

forming an electrolyte second film electrolyte on the first film, wherein the electrolyte second film blocks the flow of electrons while permitting the flow of ions, and wherein forming the electrolyte second film includes;

depositing electrolyte material using a deposition source; and

supplying energized particles from a second source such that the particles provide energy to the electrolyte material to deposit the electrolyte material into a desired film structure; and

forming an electrode third film on the second film,

wherein the forming of the first film includes depositing a vanadium oxide, the forming of the second film includes depositing lithium phosphorus oxynitride, and the forming of the third film includes depositing a lithium intercalation material, and

wherein the forming the electrolyte second film includes forming the electrolyte film to a thickness of less than 1000 Angstroms.

96. A method comprising:

providing a substrate;

depositing an electrolyte second film on the first film, wherein the electrolyte second film blocks, the flow of electrons while permitting the flow of ions, and wherein the electrolyte second film includes LIPON electrolyte material deposited using an electrolyte deposition source and energized nitrogen particles from a second source such that the energized nitrogen particles provide energy to the electrolyte material during its deposition to form the electrolyte material into a desired film structure; and

depositing an electrode third film on the second film,

wherein the electrolyte second film is deposited to a thickness in a range of about 10 Angstroms and about 200 Angstroms.

97. The method of claim 96, wherein the electrolyte second film is deposited to a thickness in a range of about 10 Angstroms and about 100 Angstroms.

98. The method of claim 96, wherein the electrolyte second film is deposited to a thickness in a range of about 10 Angstroms and about 50 Angstroms.

99. The method of claim 96, wherein the forming of the second film includes depositing lithium phosphorus oxynitride.

100. An apparatus comprising:

means for providing a substrate;

means for depositing an electrode first film on the substrate;

means for depositing an electrolyte second film on the first film, wherein the electrolyte second film blocks the flow of electrons while permitting the flow of ions, and wherein the electrolyte second film includes LIPON electrolyte material deposited using an electrolyte deposition source and energized nitrogen particles from a second source such that the energized nitrogen particles provide energy to the electrolyte material during its deposition to form the electrolyte material into a desired film structure; and

means for depositing an electrode third film to form a battery that includes the electrolyte second film and the electrode first film,

wherein the electrolyte second film is deposited to a thickness of less than about 1000 Angstroms.

101. The apparatus of claim 100, wherein the electrolyte second film is deposited to a thickness in a range of about 10 Angstroms and about 200 Angstroms.

102. The apparatus of claim 100, wherein the electrolyte second film is deposited to a thickness in a range of about 10 Angstroms and about 50 Angstroms.

103. The apparatus of claim 100, wherein the electrolyte second film is lithium phosphorus oxynitride.