Lithographic apparatus and device manufacturing method utilizing dynamic correction for magnification and position in maskless lithography
First Claim
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1. A lithographic apparatus, comprising:
- an illumination system that conditions a radiation beam;
an array of individually controllable elements that modulate the radiation beam;
a projection system that projects the modulated beam onto a target portion of a substrate; and
a pattern controller that provides control signals to the array of individually controllable elements, wherein the pattern controller comprises a pattern adjuster, wherein the pattern adjuster adjusts the radiation intensity of the portion of the modulated beam at a boundary between regions in a desired pattern of relatively high radiation intensity and adjacent regions of relatively low radiation intensity in order to adjust the position of the boundary.
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Abstract
A lithographic apparatus in which a size and/or a position of features formed on a substrate are adjusted by adjusting an intensity of radiation at boundaries of pattern features.
21 Citations
14 Claims
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1. A lithographic apparatus, comprising:
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an illumination system that conditions a radiation beam; an array of individually controllable elements that modulate the radiation beam; a projection system that projects the modulated beam onto a target portion of a substrate; and a pattern controller that provides control signals to the array of individually controllable elements, wherein the pattern controller comprises a pattern adjuster, wherein the pattern adjuster adjusts the radiation intensity of the portion of the modulated beam at a boundary between regions in a desired pattern of relatively high radiation intensity and adjacent regions of relatively low radiation intensity in order to adjust the position of the boundary.
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2. A lithographic apparatus, comprising:
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an illumination system that conditions a radiation beam; an array of individually controllable elements that modulate the radiation beam; a projection system that projects the modulated beam onto a target portion of a substrate; and a pattern controller that provides control signals to the array of individually controllable elements, wherein the pattern controller comprises a pattern adjuster, wherein the pattern adjuster determines a required adjustment of the position of boundaries of features of the desired pattern that are defined by regions of relatively high required radiation intensity in order to produce the required adjustment of at least one of size and position of the at least part of the pattern generated on the substrate, such that, when the boundary is moved towards the region of relatively low required radiation intensity, the pattern adjuster increases the intensity of the modulated beam at the boundary; and when the boundary is moved towards the region of relatively high required radiation intensity, the pattern adjuster decreases the intensity of the modulated beam at the boundary.
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3. A lithographic apparatus, comprising:
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an illumination system that conditions a radiation beam; an array of individually controllable elements that modulate the radiation beam; a projection system that projects the modulated beam onto a target portion of a substrate; and a pattern controller that provides control signals to the array of individually controllable elements, wherein the pattern controller comprises a pattern adjuster, and wherein the pattern controller determines a radiation intensity for a plurality of virtual points on the substrate that collectively generate the desired pattern; a number of the virtual points in a given region of the pattern is greater than a number of individually controllable elements used to generate the region of the pattern; and the pattern controller determines radiation intensity in the part of the radiation beam corresponding to each of the individually controllable elements based on the radiation intensity for a plurality of the virtual points. - View Dependent Claims (4, 5)
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6. A lithographic apparatus, comprising:
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an illumination system that conditions a radiation beam; an array of individually controllable elements that modulate the radiation beam; a projection system that projects the modulated beam onto a target portion of a substrate; and a pattern controller that provides control signals to the array of individually controllable elements, wherein the pattern controller determines a nominal intensity of the portion of the modulated beam associated with each of the individually controllable elements to generate the desired pattern prior to adjusting at least one of the size and the position of the at least part of the pattern; the pattern adjuster determines the required adjustment of the position of the boundaries of features of the desired pattern that are defined by regions of relatively high required radiation intensity in order to produce the adjustment of at least one of the size and the position of the at least part of the pattern generated on the substrate; and the adjustment of the position of the pattern feature boundary is performed by setting each of the individually controllable elements, such that the intensity of the corresponding portion of the modulated beam is a weighted average of the nominal intensity for the individually controllable element and the nominal intensity of at least one other individually controllable element located, relative to the individually controllable elements being set, in a direction parallel to a direction of the adjustment of the boundary, wherein the weight of the average is determined by the size of the adjustment of the boundary that is required. - View Dependent Claims (7, 8, 13, 14)
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9. A lithographic apparatus, comprising:
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an illumination system that conditions a radiation beam; an array of individually controllable elements that modulate the radiation beam; a projection system that projects the modulated beam onto a target portion of a substrate; and a pattern controller that provides control signals to the array of individually controllable elements, wherein the pattern controller comprises a pattern adjuster, and wherein the pattern to be generated on the substrate is arranged such that the portion of the desired pattern associated with each individually controllable element is one of a plurality of pattern characters; each of the pattern characters is associated with a corresponding intensity of the portion of the modulated beam of the individually controllable element; and the pattern controller sets each of the individually controllable elements to provide the intensity in each corresponding portion of the modulated beam according to the pattern character assigned to the individually controllable elements. - View Dependent Claims (10, 11, 12)
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Specification