Plasma processing apparatus
First Claim
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1. A plasma processing apparatus comprising:
- a rectangular waveguide in which microwaves are transmitted;
a slot antenna provided in a magnetic field side;
a microwave transmitting window; and
a vacuum chamber into which process gas is introduced,wherein the microwaves being transmitted in said rectangular waveguide form standing waves and pass through said microwave transmitting window via said slot antenna so as to generate surface waves, and the process gas in said vacuum chamber is excited by the surface waves to thereby generate surface wave plasma, with which a substrate is processed, and wherein said slot antenna includes at least one first slot antenna provided with an aperture having a curved or bent shape generally extending in a longitudinal direction of the rectangular waveguide and being positioned such that the aperture substantially follows lines of magnetic force of the microwaves.
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Abstract
In a plasma processing apparatus, microwaves being transmitted in a waveguide pass through a microwave transmitted window via first and second slot antennas provided in a magnetic field side, so as to form surface waves. Process gas in a chamber is excited by the surface waves so as to generate surface wave plasma. A substrate is processed by the plasma. Each first slot antenna is provided with an aperture, which has a curved or bent shape and whose longitudinal direction extends substantially to follow the lines of magnetic force of the microwaves. Each second slot antenna is provided with an aperture which has a rectangular shape.
227 Citations
6 Claims
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1. A plasma processing apparatus comprising:
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a rectangular waveguide in which microwaves are transmitted; a slot antenna provided in a magnetic field side; a microwave transmitting window; and a vacuum chamber into which process gas is introduced, wherein the microwaves being transmitted in said rectangular waveguide form standing waves and pass through said microwave transmitting window via said slot antenna so as to generate surface waves, and the process gas in said vacuum chamber is excited by the surface waves to thereby generate surface wave plasma, with which a substrate is processed, and wherein said slot antenna includes at least one first slot antenna provided with an aperture having a curved or bent shape generally extending in a longitudinal direction of the rectangular waveguide and being positioned such that the aperture substantially follows lines of magnetic force of the microwaves. - View Dependent Claims (2, 3, 4, 5, 6)
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Specification