Method of fabricating a polysilicon layer
First Claim
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1. A method of fabricating a polysilicon layer, comprising:
- providing a substrate;
forming a first low-k material layer over the substrate;
forming a first set of trenches in the first low-k material layer;
forming an amorphous silicon layer over the first low-k material layer without contacting the substrate; and
conducting a laser annealing process to crystallize the amorphous silicon layer into a polysilicon layer, wherein the polysilicon layer includes a plurality of crystal boundaries and the crystal boundaries are located outside the trenches and between each pair of neighboring trenches.
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Abstract
A method of fabrication a polysilicon layer is provided. A substrate is provided and then a buffer layer having a plurality of trenches thereon is formed over the substrate. Thereafter, an amorphous silicon layer is formed over the buffer layer. Finally, a laser annealing process is conducted so that the amorphous silicon layer melts and crystallizes into a polysilicon layer starting from the upper reach of the trenches. This invention can be applied to fabricate the polysilicon layer of a low temperature polysilicon thin film transistor liquid crystal display such that the crystals inside the polysilicon layer are uniformly distributed and have a larger average size.
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10 Claims
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1. A method of fabricating a polysilicon layer, comprising:
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providing a substrate; forming a first low-k material layer over the substrate; forming a first set of trenches in the first low-k material layer; forming an amorphous silicon layer over the first low-k material layer without contacting the substrate; and conducting a laser annealing process to crystallize the amorphous silicon layer into a polysilicon layer, wherein the polysilicon layer includes a plurality of crystal boundaries and the crystal boundaries are located outside the trenches and between each pair of neighboring trenches. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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Specification