Process apparatus and method for improving plasma production of an inductively coupled plasma

• US 7,255,774 B2
• Filed: 09/26/2002
• Issued: 08/14/2007
• Est. Priority Date: 09/26/2002
• Status: Expired due to Fees

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Vukovic, Mirko, Sill, Edward L.
• Primary Examiner(s): ALEJANDRO MULERO, LUZ L
• Application Number:
  US10/255,460
• Publication Number:
  US 20040060517A1
• Time in Patent Office: 1,783 Days
• Field of Search: 118/723.I, 118/723.IR, 118/723.AN, 156/345.48, 156/345.49, 315/111.51
• US Class Current: 156/345.48
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma

Abstract

A processing system for processing a substrate with a plasma comprises a processing chamber defining a processing space for containing a substrate to be processed with a plasma formed within the chamber. A dielectric window interfaces with the processing chamber proximate the processing space. A core element formed of a material having a high magnetic permeability is positioned outside of the chamber proximate the dielectric window, and an electrically conductive element surrounds a portion of the core element of high magnetic permeability. The conductive element, when electrical current is conducted thereby, is operable for coupling a magnetic flux into the chamber through the dielectric window for affecting a plasma in the processing space. The core element is configured for directing a portion of the magnetic flux in a direction toward the dielectric window to efficiently couple the channeled flux into the processing chamber through the dielectric window.

Claims

1. A processing system for processing a substrate with a plasma, comprising:

a processing chamber defining a processing space for containing a substrate to be processed with a plasma formed within the processing chamber;

a planar dielectric window interfacing with the processing chamber proximate to the processing space;

a core element formed of a material having a high magnetic permeability in comparison with air, the core element positioned outside of the processing chamber and proximate to the dielectric window and having an axis aligned generally parallel to the dielectric window, and the core element including a first surface facing toward the processing space, a second surface facing away from the processing space, and a channel defined in at least the second surface; and

an antenna positioned outside of the processing chamber, the antenna including a plurality of coil turns wound circumferentially about the axis of the core element, at least one of said coil turns including a segment positioned in the channel and separated from the planar dielectric window by the core element, and the antenna, when electrical current is conducted thereby, operative to generate a magnetic flux directed by the core element into the processing space through the dielectric window for forming the plasma in the processing space.

2. The processing system of claim 1

wherein the channel is also formed in said first surface of the core element and, at least a portion of the antenna being positioned in the channel of the first surface.

3. The processing system of claim 1 wherein the core element is shaped for directing the magnetic flux in a direction generally perpendicular to a plane containing the dielectric window.

4. The processing system of claim 1 wherein said material having a high magnetic permeability is formed from a powder of a material selected from the group consisting of iron, iron-nickel alloys, iron-molybdenum alloys, and iron-nickel-molybdenum alloys, said powder including particles covered by an electrically insulating outer layer.

5. The processing system of claim 1 wherein said material having a high magnetic permeability is a mixture of an iron oxide and a metal oxide.

7. The processing system of claim 5 wherein said mixture further includes a metal carbonate.

8. The processing system of claim 7 wherein said metal carbonate is selected from the group consisting of manganese carbonate, zinc carbonate, nickel carbonate, and magnesium carbonate.

9. The processing system of claim 1 wherein said material having a high magnetic permeability is a mixture of iron oxide and a metal carbonate.

10. The processing system of claim 9 wherein said metal carbonate is selected from the group consisting of manganese carbonate, zinc carbonate, nickel carbonate, and magnesium carbonate.

11. The processing system of claim 1 wherein said material having a high magnetic permeability has a relative magnetic permeability in the range of about 50 to about 100.

12. The processing system of claim 1 further comprising:

a cover formed of a material having a high magnetic permeability in comparison with air, the cover positioned relative to the core element so that the segment of the at least one of said coil turns is disposed between the cover and the core element.

6. The processing chamber of system 5 wherein said metal oxide is selected from the group consisting of manganese oxide, zinc oxide, nickel oxide, and magnesium oxide.