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Replaceable plate expanded thermal plasma apparatus and method

  • US 7,282,244 B2
  • Filed: 09/05/2003
  • Issued: 10/16/2007
  • Est. Priority Date: 09/05/2003
  • Status: Expired due to Fees
First Claim
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1. A method of depositing a layer on a substrate, comprising:

  • determining a target process condition selected from a target ionization voltage, a target pressure, and a target resistivity, within a chamber of an expanding thermal plasma generator for plasma enhanced chemical vapor deposition of a coating on a substrate;

    the generator comprising a cathode, replaceable cascade plate and anode with concentric orifice; and

    replacing the cascade plate with another plate having a configured orifice to effect the identified target process condition; and

    generating a plasma at the target process condition by providing a plasma gas to the plasma generator and ionizing the plasma gas in an arc between cathode and anode within the generator and expanding the gas as a plasma onto a substrate in a deposition chamber.

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