Replaceable plate expanded thermal plasma apparatus and method
First Claim
1. A method of depositing a layer on a substrate, comprising:
- determining a target process condition selected from a target ionization voltage, a target pressure, and a target resistivity, within a chamber of an expanding thermal plasma generator for plasma enhanced chemical vapor deposition of a coating on a substrate;
the generator comprising a cathode, replaceable cascade plate and anode with concentric orifice; and
replacing the cascade plate with another plate having a configured orifice to effect the identified target process condition; and
generating a plasma at the target process condition by providing a plasma gas to the plasma generator and ionizing the plasma gas in an arc between cathode and anode within the generator and expanding the gas as a plasma onto a substrate in a deposition chamber.
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Accused Products
Abstract
The present invention provides a deposition process for plasma enhanced chemical vapor deposition of a coating on a substrate. The process comprises detennining a target process condition within a chamber of an expanding thermal plasma generator; the generator comprising a cathode, a replaceable cascade plate and an anode comprising a concentric orifice; and thereafter replacing the cascade plate with another plate having a configured orifice to effect the identified target process condition. The plasma is then generated at the target process condition by providing a plasma gas to the plasma generator and ionizing the plasma gas in an arc between cathode and anode within the generator and expanding the gas as a plasma onto a substrate in a deposition chamber.
28 Citations
17 Claims
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1. A method of depositing a layer on a substrate, comprising:
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determining a target process condition selected from a target ionization voltage, a target pressure, and a target resistivity, within a chamber of an expanding thermal plasma generator for plasma enhanced chemical vapor deposition of a coating on a substrate;
the generator comprising a cathode, replaceable cascade plate and anode with concentric orifice; andreplacing the cascade plate with another plate having a configured orifice to effect the identified target process condition; and generating a plasma at the target process condition by providing a plasma gas to the plasma generator and ionizing the plasma gas in an arc between cathode and anode within the generator and expanding the gas as a plasma onto a substrate in a deposition chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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Specification