Process and structure for fabrication of MEMS device having isolated edge posts
First Claim
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1. A method of fabricating a microelectromechanical systems (MEMS) device, comprising:
- forming an electrode layer over a substrate;
depositing a sacrificial layer over the electrode layer;
forming a plurality of support structures, said support structures extending through the sacrificial layer, wherein at least some of said plurality of support structures comprise edge support structures;
depositing a mechanical layer over the plurality of support structures;
patterning the mechanical layer to form strips, wherein said strips are separated by gaps, and wherein said gaps are located over a central portion of each of said edge support structures; and
after forming the plurality of support structures, etching a portion of each of said edge support structures underlying the gaps, thereby forming isolated edge support structures.
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Abstract
A method of fabricating an array of MEMS devices includes the formation of support structures located at the edge of upper strip electrodes. A support structure is etched to form a pair of individual support structures located at the edges of a pair of adjacent electrodes. The electrodes themselves may be used as a hard mask during the etching of these support structures. A resultant array of MEMS devices includes support structures having a face located at the edge of an overlying electrode and coincident with the edge of the overlying electrode.
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26 Claims
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1. A method of fabricating a microelectromechanical systems (MEMS) device, comprising:
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forming an electrode layer over a substrate; depositing a sacrificial layer over the electrode layer; forming a plurality of support structures, said support structures extending through the sacrificial layer, wherein at least some of said plurality of support structures comprise edge support structures; depositing a mechanical layer over the plurality of support structures; patterning the mechanical layer to form strips, wherein said strips are separated by gaps, and wherein said gaps are located over a central portion of each of said edge support structures; and after forming the plurality of support structures, etching a portion of each of said edge support structures underlying the gaps, thereby forming isolated edge support structures. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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Specification