Gas barrier film

• US 7,354,625 B2
• Filed: 02/14/2003
• Issued: 04/08/2008
• Est. Priority Date: 02/14/2002
• Status: Expired due to Fees

• Current Assignee: Fujifilm Corporation (Fujifilm Holdings Corporation)
• Original Assignee: Fujifilm Corporation (Fujifilm Holdings Corporation)
• Inventors: Kawamura, Koichi, Kano, Takeyoshi, Takahashi, Miki
• Primary Examiner(s): TARAZANO, DONALD LAWRENCE
• Application Number:
  US10/366,381
• Publication Number:
  US 20030157346A1
• Time in Patent Office: 1,880 Days
• Field of Search: 428457-4723, 428/483, 427/498, 427/512, 427/582, 427/484, 427/419.1, 427/488, 427/491, 427532-540, 427/569
• US Class Current: 427/419.1
• CPC Class Codes: B32B 27/14 next to a particulate layer
• CPC Class Codes: C08J 7/0423 with at least one layer of inorganic material and at least one layer of a composition containing a polymer binder
• CPC Class Codes: C08J 7/043 Improving the adhesiveness of the coatings per se, e.g. forming primers adhesives in the form of films or foils characterised by the primer layers between the polymer carriers and the adhesives C09J7/50
• CPC Class Codes: C08J 7/048 Forming gas barrier coatings
• CPC Class Codes: C08J 7/056 Forming hydrophilic coatings
• CPC Class Codes: C08J 7/06 with compositions not containing macromolecular substances
• CPC Class Codes: C23C 14/024 Deposition of sublayers, e.g. to promote adhesion of the coating C23C14/027 takes precedence
• CPC Class Codes: Y10T 428/31667 Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
• CPC Class Codes: Y10T 428/31797 Next to addition polymer from unsaturated monomers
• CPC Class Codes: Y10T 428/31855 Of addition polymer from unsaturated monomers
• CPC Class Codes: Y10T 428/31928 Ester, halide or nitrile of addition polymer

Abstract

The invention provides a gas barrier film having a support including a hydrophilic surface or a non-ionic hydrophobic surface on which a graft polymer chain having a polar group is present, and an inorganic thin film formed on the surface.

Claims

1. A method of producing a gas barrier film comprising the steps of:

preparing a substrate made of polyester;

allowing the substrate to react with a hydrophilic polymer selected from the group consisting of polyacrylic acid, polymethacrylic acid, polystyrene sulfonic acid, poly-2-acrylamide-2-methylpropane sulfonic acid and salts thereof, polyacrylamide, and polyvinyl acetamide, the hydrophilic polymer having at a terminal end or in a side chain thereof a functional group that is capable of reacting with the substrate to form a hydrophilic graft polymer layer; and

forming an inorganic thin film on the formed hydrophilic graft polymer layer by a gas phase method using an inorganic compound or by an inorganic fine particle adsorption method,

wherein the functional group is selected from the group consisting of a silane coupling group, an isocyanate group, an amino group, a hydroxyl group, a carboxyl group, a sulfonic acid group, a phosphoric acid group, and an epoxy group.

2. A method of producing a gas barrier film according to claim 1, wherein the gas phase method is selected from the group consisting of chemical vapor deposition, vacuum deposition and sputtering.

3. A method of producing a gas barrier film according to claim 1, wherein an inorganic material of the inorganic thin film is selected from the group consisting of aluminum (Al), zinc (Zn), magnesium (Mg), nickel (Ni), chromium (Cr), zinc oxide (ZnO), titanium oxide (TiO₂), aluminum oxide (Al₂O₃), magnesium oxide (MgO), tin oxide (SnO₂), indium oxide (In₂O₃), indium tin oxide (ITO), silicon (Si), silicon monoxide (SiO) and silicon dioxide (SiO₂).

4. A method of producing a gas barrier film according to claim 1, wherein the inorganic thin film has a thickness of 10 to 1,000 nm.

5. A method of producing a gas barrier film comprising the steps of:

preparing a substrate made of polyester;

applying energy to the surface of the substrate by plasma irradiation, light irradiation or heating to provide active species on the surface of the substrate;

allowing the substrate having the active species on the surface thereof to react with a compound having a hydrophilic functional group and a double bond in a molecule, to polymerize the compound from a starting point on the substrate to thereby form a hydrophilic graft polymer layer; and

forming an inorganic thin film on the formed hydrophilic graft polymer layer by a gas phase method using an inorganic compound or by an inorganic fine particle adsorption method,

wherein the hydrophilic functional group is selected from the group consisting of an ammonium group, a phosphonium group, a sulfonic acid group, a carboxyl group, a phosphoric acid group and a phosphonic acid group.

6. A method of producing a gas barrier film according to claim 5, wherein the gas phase method is selected from the group consisting of chemical vapor deposition, vacuum deposition and sputtering.

7. A method of producing a gas barrier film according to claim 5, wherein an inorganic material of the inorganic thin film is selected from the group consisting of aluminum (Al), zinc (Zn), magnesium (Mg), nickel (Ni), chromium (Cr), zinc oxide (ZnO), titanium oxide (TiO₂), aluminum oxide (Al₂O₃), magnesium oxide (MgO), tin oxide (SnO₂), indium oxide (In₂O₃), indium tin oxide (ITO), silicon (Si), silicon monoxide (SiO) and silicon dioxide (SiO₂).

8. A method of producing a gas barrier film according to claim 5, wherein the inorganic thin film has a thickness of 10 to 1,000 nm.