Method for synthesizing polymeric material, method for forming polymer thin film and method for forming interlayer insulating film

• US 7,396,778 B2
• Filed: 07/11/2005
• Issued: 07/08/2008
• Est. Priority Date: 04/08/2002
• Status: Expired due to Fees

• Current Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Original Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Inventors: Aoi, Nobuo
• Primary Examiner(s): Ghyka; Alexander G
• Application Number:
  US11/177,569
• Publication Number:
  US 20050245097A1
• Time in Patent Office: 1,093 Days
• Field of Search: 438/780, 524/48, 525/436, 528/12
• US Class Current: 438/780
• CPC Class Codes: C08G 73/10 Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
• CPC Class Codes: C08J 5/18 Manufacture of films or sheets
• CPC Class Codes: H01L 21/02118 carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC polymers per se C08G, photoresist per se G03F
• CPC Class Codes: H01L 21/02203 the layer being porous
• CPC Class Codes: H01L 21/312 Organic layers, e.g. photoresist H01L21/3105, H01L21/32 take precedence; photoresists per se G03C

Abstract

A Lewis acid-base reaction is caused, in a solution, between a first monomer corresponding to a Lewis acid and a second monomer corresponding to a Lewis base, so as to generate a monomer adduct in which the first monomer and the second monomer are bonded to each other through weak electric interaction. Next, the solution including the monomer adduct is applied on a substrate so as to form a supramolecular solid thin film made of the monomer adduct. Then, the supramolecular solid thin film is heated so as to cause a polymerization reaction between the first monomer and the second monomer within the supramolecular solid thin film, thereby forming a polymer thin film.

Claims

1. A method for synthesizing a polymeric material comprising the steps of:

forming a supramolecular structure by allowing a Lewis acid and a Lewis base in a solution state to self-organize through acid-base interaction; and

generating a polymer three-dimensional structure by polymerizing said Lewis acid and said Lewis base included in said supramolecular structure with said supramolecular structure used as a polymerization reaction field,

wherein said Lewis acid is an adamantane derivative having a carboxyl group, and

said Lewis base is a tetraaminobenzidine derivative having an amino group, a tetraaminobenzene derivative having an amino group or a diaminodihydroxylbenzene derivative having an amino group.

2. The method for synthesizing a polymeric material of claim 1,

wherein said polymer three-dimensional structure is a thin film including a large number of fine pores arranged at high regularity therein.

3. A method for synthesizing a polymeric material comprising the steps of:

generating a monomer adduct in which a first monomer corresponding to a Lewis acid and a second monomer corresponding to a Lewis base are bonded to each other through weak electric interaction by causing a Lewis acid-base reaction between said first monomer and said second monomer in a solution;

generating a supramolecular solid made of said monomer adduct by evaporating a solvent from said solution including said monomer adduct; and

generating a polymer solid by causing a polymerization reaction between said first monomer and said second monomer within said supramolecular solid,

wherein said Lewis acid is an adamantane derivative having a carboxyl group, and

said Lewis base is a tetraaminobenzidine derivative having an amino group, a tetraaminobenzene derivative having an amino group or a diaminodihydroxylbenzene derivative having an amino group.

4. The method for synthesizing a polymeric material of claim 3,

wherein said adamantane derivative having a carboxyl group is a 1-carboxyladamantane derivative, a 1,3-dicarboxyladamantane derivative, a 1,3,5-tricarboxyladamantane derivative, a 1,3,5,7-tetracarboxyladamantane derivative or a mixture of any of said derivatives.

7. The method for synthesizing a polymeric material of claim 3, wherein at least one of said first monomer and said second monomer has a flexible bond.

8. The method for synthesizing a polymeric material of claim 7,

wherein said flexible bond is formed by a methylene group.

5. A method for synthesizing a polymeric material comprising the steps of:

generating a monomer adduct in which a first monomer corresponding to a Lewis acid and a second monomer corresponding to a Lewis base are bonded to each other through weak electric interaction by causing a Lewis acid-base reaction between said first monomer and said second monomer in a solution;

generating a supramolecular solid made of said monomer adduct by evaporating a solvent from said solution including said monomer adduct; and

generating a polymer solid by causing a polymerization reaction between said first monomer and said second monomer within said supramolecular solid,

wherein said Lewis acid is a benzene derivative having a carboxyl group, a benzidine derivative having a carboxyl group, a naphthalene derivative having a carboxyl group, an anthracene derivative having a carboxyl group or a tetracene derivative having a carboxyl group,

and said Lewis base is an adamantane derivative having an amino group.

6. The method for synthesizing a polymeric material of claim 5,

wherein said adamantane derivative having an amino group is a 1-aminoadamantane derivative, a 1,3-diaminoadamantane derivative, a 1,3,5-triaminoadamantane derivative, a 1,3,5,7-tetraamine derivative or a mixture of any of said derivatives.

9. A method for forming a polymer thin film comprising the steps of:

generating a monomer adduct in which a first monomer corresponding to a Lewis acid and a second monomer corresponding to a Lewis base are bonded to each other through weak electric interaction by causing a Lewis acid-base reaction between said first monomer and said second monomer in a solution;

forming a supramolecular solid thin film made of said monomer adduct by applying said solution including said monomer adduct on a substrate; and

forming a polymer thin film by causing a polymerization reaction between said first monomer and said second monomer within said supramolecular solid thin film by heating said supramolecular solid thin film,

wherein said Lewis acid is an adamantane derivative having a carboxyl group, and

said Lewis base is a tetraaminobenzidine derivative having an amino group, a tetraaminobenzene derivative having an amino group or a diaminodihydroxylbenzene derivative having an amino group.

10. The method for forming a polymer thin film of claim 9,

wherein said adamantane derivative having a carboxyl group is a 1-carboxyladamantane derivative, a 1,3-dicarboxyladamantane derivative, a 1,3,5-tricarboxyladamantane derivative, a 1,3,5,7-tetracarboxyladamantane derivative or a mixture of any of said derivatives.

13. The method for forming a polymer thin film of claim 9,

wherein at least one of said first monomer and said first monomer has a flexible bond.

14. The method for forming a polymer thin film of claim 13,

wherein said flexible bond is formed by a methylene group.

11. A method for forming a polymer thin film comprising the steps of:

generating a monomer adduct in which a first monomer corresponding to a Lewis acid and a second monomer corresponding to a Lewis base are bonded to each other through weak electric interaction by causing a Lewis acid-base reaction between said first monomer and said second monomer in a solution;

forming a supramolecular solid thin film made of said monomer adduct by applying said solution including said monomer adduct on a substrate; and

forming a polymer thin film by causing a polymerization reaction between said first monomer and said second monomer within said supramolecular solid thin film by heating said supramolecular solid thin film,

wherein said Lewis acid is a benzene derivative having a carboxyl group, a benzidine derivative having a carboxyl group, a naphthalene derivative having a carboxyl group, an anthracene derivative having a carboxyl group or a tetracene derivative having a carboxyl group, and

said Lewis base is an adamantane derivative having an amino group.

12. The method for forming a polymer thin film of claim 11,

wherein said adamantane derivative having an amino group is a 1-aminoadamantane derivative, a 1,3-diaminoadamantane derivative, a 1,3,5-triaminoadamantane derivative, a 1,3,5,7-tetraamine derivative or a mixture of any of said derivatives.