Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus

  • US 7,403,264 B2
  • Filed: 07/08/2004
  • Issued: 07/22/2008
  • Est. Priority Date: 07/08/2004
  • Status: Active Grant
First Claim
Patent Images

1. Lithographic projection apparatus comprising:

  • a support structure configured to hold a patterning device to impart a selected pattern to a beam of radiation;

    a substrate table configured to hold a substrate;

    a projection system configured to project the patterned beam onto a target portion of the substrate to form an image;

    a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration values;

    a modelling system configured to determine an application-specific effect of said predicted projection system aberration changes on at least one parameter of the image for the selected pattern;

    a control system configured to generate a control signal specific to the selected pattern according to said predicted projection system aberration changes and their application-specific effect on the at least one parameter of the image; and

    an image adjusting system, responsive to the control signal, to compensate for the application-specific effect of said predicted projection system aberration changes on the image.

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