Gas supply member and plasma processing apparatus
First Claim
1. A gas supply member for use in a chamber of a plasma processing apparatus, comprising:
- a bottom surface facing an inner space of the chamber; and
a plurality of gas holes formed in the bottom surface to supply a gas through the gas holes to the inner space,wherein an opening portion of each gas hole has a slant surface and all of the bottom surface between neighboring gas holes is formed of only slant surfaces of opening portions of the gas holes, andwherein the slant surface includes at least any one of a flat surface and a curved surface.
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Accused Products
Abstract
A gas supply member is disposed in a chamber of a plasma processing apparatus and has a planar surface facing an inner space of the chamber and a plurality of gas holes bored in the planar surface to supply a gas through the gas holes to the inner space. An outer periphery portion of each gas hole at the planar surface has a slant surface formed to correspond to a flow of the gas injected through each gas hole. Further, the slant surface includes at least any one of a flat surface and a curved surface. An angle formed between the slant surface and the planar surface is equal to or greater than that formed between the planar surface and a distribution of the gas injected through each gas hole.
31 Citations
12 Claims
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1. A gas supply member for use in a chamber of a plasma processing apparatus, comprising:
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a bottom surface facing an inner space of the chamber; and a plurality of gas holes formed in the bottom surface to supply a gas through the gas holes to the inner space, wherein an opening portion of each gas hole has a slant surface and all of the bottom surface between neighboring gas holes is formed of only slant surfaces of opening portions of the gas holes, and wherein the slant surface includes at least any one of a flat surface and a curved surface. - View Dependent Claims (2, 3, 4, 5)
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6. A gas supply member for use in a chamber of a plasma processing apparatus, comprising:
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a bottom surface facing an inner space of the chamber; a plurality of grooves concentrically formed in the bottom surface; and a plurality of gas holes formed in the grooves to supply a gas through the gas holes to the inner space, wherein all of the bottom surface between neighboring gas holes is formed of only slant surfaces of the grooves, and wherein each of the slant surfaces includes at least any one of a flat surface and a curved surface. - View Dependent Claims (7)
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8. A gas supply member for use in a chamber of a plasma processing apparatus, comprising:
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a bottom surface facing an inner space of the chamber; and gas channels, opened at the bottom surface, for supplying a gas into the inner space, wherein an opening portion of each gas channel has a slant surface and all of the bottom surface between neighboring gas channels is formed of only slant surfaces of opening portions of the gas channels, and wherein the slant surface includes at least any one of a flat surface and a curved surface. - View Dependent Claims (9, 10)
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11. A plasma processing apparatus, which includes a chamber for accommodating therein an object to be processed;
- and a gas supply member, disposed in the chamber, for supplying a gas into an inner space of the chamber,
wherein the gas supply member has a bottom surface facing the inner space, and a plurality of gas holes formed in the bottom surface to supply a gas through the gas holes into the inner space, wherein an opening portion of each gas hole has a slant surface and all of the bottom surface between neighboring gas holes is formed of only slant surfaces of opening portions of the gas holes, and wherein the slant surface includes at least any one of a flat surface and a curved surface. - View Dependent Claims (12)
- and a gas supply member, disposed in the chamber, for supplying a gas into an inner space of the chamber,
Specification