Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic projection apparatus comprising:
- a substrate table configured to hold a substrate;
a projection system arranged to project a patterned beam of radiation onto the substrate;
a liquid supply system configured to supply liquid to a space between the projection system and the substrate table; and
a residual liquid detector configured to detect liquid remaining on the substrate when the substrate is held by the substrate table and/or on the substrate table, after an exposure is completed.
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Abstract
In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
186 Citations
25 Claims
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1. A lithographic projection apparatus comprising:
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a substrate table configured to hold a substrate; a projection system arranged to project a patterned beam of radiation onto the substrate; a liquid supply system configured to supply liquid to a space between the projection system and the substrate table; and a residual liquid detector configured to detect liquid remaining on the substrate when the substrate is held by the substrate table and/or on the substrate table, after an exposure is completed. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A lithographic projection apparatus comprising:
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a substrate table configured to hold a substrate; a projection system arranged to project a patterned beam of radiation onto the substrate; a liquid supply system configured to supply liquid to a space between the projection system and the substrate; and a detector configured to detect a property of a surface of the substrate and/or the substrate table after an exposure with liquid in the space is completed, wherein a measurement of the property by the detector that is outside a normal operating range or varies significantly from a previous measurement before application of liquid to the surface is indicative of the presence of liquid on the surface. - View Dependent Claims (16, 17, 18, 19, 20)
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21. A lithographic projection apparatus comprising:
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a substrate table configured to hold a substrate; a projection system arranged to project a patterned beam of radiation onto the substrate; a liquid supply system configured to supply liquid to a space between the projection system and the substrate; a liquid detector configured to detect residual liquid remaining on the substrate and/or the substrate table; and a drying station configured to dry the substrate, the substrate table, or both in the event that residual liquid is detected by the liquid detector. - View Dependent Claims (22, 23, 24)
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25. A lithographic projection apparatus comprising:
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a substrate table configured to hold a substrate; a projection system arranged to project a patterned beam of radiation onto the substrate; a liquid supply system configured to supply liquid to a space between the projection system and the substrate; a radiation source configured to direct a beam of radiation onto or adjacent a surface of the substrate and/or the substrate table; and a detector configured to detect reflected or refracted radiation from the beam and determine, from the detection, presence of liquid on the surface after exposure of the substrate with liquid in the space, the detector being arranged to detect the reflected or refracted radiation in parallel with projection of the patterned beam by the projection system.
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Specification