Trench measurement system employing a chromatic confocal height sensor and a microscope

• US 7,477,401 B2
• Filed: 10/28/2005
• Issued: 01/13/2009
• Est. Priority Date: 11/24/2004
• Status: Active Grant

• Current Assignee: Onto Innovation Inc.
• Original Assignee: Tamar Technology, Inc. (Onto Innovation Inc.)
• Inventors: Marx, David S., Grant, David L.
• Primary Examiner(s): Punnoose; Roy M
• Application Number:
  US11/261,284
• Publication Number:
  US 20060109483A1
• Time in Patent Office: 1,173 Days
• Field of Search: 356/609
• US Class Current: 356/609
• CPC Class Codes: G01B 11/0608 Height gauges
• CPC Class Codes: G01B 11/24 for measuring contours or curvatures
• CPC Class Codes: G01B 2210/50 Using chromatic effects to achieve wavelength-dependent depth resolution
• CPC Class Codes: G02B 21/0016 Technical microscopes, e.g. for inspection or measuring in industrial production processes
• CPC Class Codes: G02B 21/0064 multi-spectral or wavelength-selective arrangements, e.g. wavelength fan-out, chromatic profiling G02B21/0076 takes precedence

Abstract

A system for the measurement of high aspect ratio trenches. The preferred embodiment consists of three elements: a) an integrated microscope and optical height sensor, b) an axially dispersive, afocal lens system, which is included in the optical height sensor, and c) an algorithm for processing the optical height sensor data to produce the depth of the high aspect ratio trench. The present invention combines a traditional imaging microscope with a chromatic confocal, single point, height sensor. This combination instantaneously provides an image of the object and the height value at one point in the image. No mechanical movement is necessary anywhere in the system to achieve that result. The chromatic confocal height sensor is integrated with a traditional microscope through the use of separate wavelength bands such as a wavelength band in the visible part of the spectrum, and a wavelength band in the infrared or ultraviolet part of the spectrum.

Claims

1. An apparatus for measuring height of selected locations in micrometer and submicrometer surfaces;

the apparatus comprising;

a chromatic confocal height sensor and an optical microscope, said sensor and said microscope having a common optical path and a common objective lens for simultaneously examining substantially the same location on a surface at disparate wavelengths of light.

2. The apparatus recited in claim 1 wherein said sensor comprises an afocal dispersive lens system and a separate objective lens.

3. The apparatus recited in claim 2 wherein said dispersive lens system is refractive and comprises a pair of spaced apart doublet lenses.

4. The apparatus recited in claim 2 wherein said dispsersive lens system is diffractive and comprises a doublet lens having a positive element and a negative element.

5. An apparatus for measuring the depth of trenches in submicrometer surfaces, the apparatus comprising:

a chromatic confocal height sensor having a light source transmitting light through a fiber optic coupler and through an afocal dispersive lens system and an objective lens onto a submicrometer surface to be measured and having a spectrometer for analyzing the wavelength composition of light returning through said fiber optic coupler to determine at which wavelength peak power of returning light occurs to measure trench depth therefrom;

a microscope operating at a wavelength not analyzed by said spectrometer and sharing said objective lens by the use of beam splitting, said microscope providing an overview of an area of said surface for aiding in the measurement of trench depth by said height sensor.

6. The apparatus recited in claim 5 wherein said height sensor operates at wavelengths in the visible light spectrum and said microscope operates at a wavelength of non-visible light.

7. The apparatus recited in claim 6 wherein said wavelength of non-visible light is an infrared wavelength.

8. The apparatus recited in claim 5 wherein said microscope comprises a CCD camera for facilitating observation of said area overview.

9. The apparatus recited in claim 5 wherein said afocal dispersive lens system comprises at lease one doublet lens.

10. A method for measuring height characteristics in a submicrometer surface;

the method comprising the steps of;

a) providing a combined chromatic confocal height sensor and microscope for examining a selected location in said surface;

b) determining whether or not the microscope image of said selected location contains a line object;

c) if the outcome of step b) is negative, then using said height sensor to detect a peak indication of surface height;

d) if the outcome of step b) is positive, then measuring the width of the line object and positioning the height sensor at the center of the line object;

e) determining whether the line width is sufficiently large to generate a single peak indication of trench depth;

f) if the outcome of step e) is positive, then using said height sensor to detect a peak indication of trench depth; and

g) if the outcome of step e) is negative, then using measured line width and other available information for carrying out a double peak indication of trench depth.