Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide

DC
  • US 7,507,848 B2
  • Filed: 08/08/2005
  • Issued: 03/24/2009
  • Est. Priority Date: 09/28/2000
  • Status: Active Grant
First Claim
Patent Images

1. A reagent for use in a thin film deposition process, the reagent comprising Hf(NEtMe)4.

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