Lithographic apparatus and device manufacturing method

  • US 7,528,931 B2
  • Filed: 12/20/2004
  • Issued: 05/05/2009
  • Est. Priority Date: 12/20/2004
  • Status: Active Grant
First Claim
Patent Images

1. A positioning apparatus for use in a lithographic apparatus for projecting a patterned beam of radiation onto a substrate, the positioning apparatus comprising:

  • a first table connected to a first positioning system configured to displace the first table into and out of a path of the patterned beam of radiation, the first table being configured to hold a substrate; and

    a second table connected to a second positioning system configured to position the second table into the path of the patterned beam of radiation when the first table is displaced out of the path of the patterned beam of radiation, the second table not being configured to hold a substrate and comprising a sensor configured to sense a property of the patterned beam of radiation.

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