Multi-station deposition apparatus and method

• US 7,547,465 B2
• Filed: 08/05/2005
• Issued: 06/16/2009
• Est. Priority Date: 04/16/2002
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Chang, Mei, Lei, Lawrence C., Glenn, Walter B.
• Primary Examiner(s): Culbert; Roberts P
• Application Number:
  US11/198,140
• Publication Number:
  US 20050271814A1
• Time in Patent Office: 1,411 Days
• Field of Search: 427/248.1, 427/251, 427/255.5, 118/719, 118/720
• US Class Current: 427/255.5
• CPC Class Codes: C23C 16/45512 Premixing before introduction in the reaction chamber
• CPC Class Codes: C23C 16/45519 Inert gas curtains
• CPC Class Codes: C23C 16/45551 for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: C23C 16/4586 Elements in the interior of the support, e.g. electrodes, heating or cooling devices
• CPC Class Codes: C23C 16/54 Apparatus specially adapted for continuous coating
• CPC Class Codes: H01L 21/67017 Apparatus for fluid treatment H01L21/67126, H01L21/6715 take precedence
• CPC Class Codes: H01L 21/67167 surrounding a central transfer chamber
• CPC Class Codes: H01L 21/6719 characterized by the construction of the processing chambers, e.g. modular processing chambers

Abstract

A multi-station deposition apparatus capable of simultaneous processing multiple substrates using a plurality of stations, where a gas curtain separates the stations. The apparatus further comprises a multi-station platen that supports a plurality of wafers and rotates the wafers into specific deposition positions at which deposition gases are supplied to the wafers. The deposition gases may be supplied to the wafer through single zone or multi-zone gas dispensing nozzles.

Claims

1. A method of depositing a material on a wafer in a deposition chamber having a plurality of deposition stations comprising:

(a) forming a gas curtain between deposition stations, the gas curtain provided by flowing gas in a first direction;

(b) positioning a wafer on one of a plurality of wafer supports in a first deposition position;

(c) introducing a first deposition gas proximate said first wafer, the first deposition gas provided by flowing the first deposition gas in a second direction that is different than the first direction;

(d) rotating the wafer into a second deposition position; and

(e) introducing a second deposition gas proximate said first wafer.

2. The method of claim 1 further comprising the step of applying a purge gas to the first wafer after the introduction of the first deposition gas and the second deposition gas.

3. The method of claim 1 further comprising the step of establishing a predefined temperature for the wafer at each of the first and second deposition positions.

4. The method of claim 1 further comprising forming purge gas curtains on either side of each wafer support.

5. The method of claim 1 further comprising:

(f) rotating the wafer to the first deposition position and repeating steps (c), (d) and (e).

6. The method of claim 1 further comprising:

positioning a second wafer on a wafer support in the first deposition position after the first wafer is rotated to the second deposition position.

7. The method of claim 1, wherein, at each deposition position, supplying a continuous flow of purge gas having a reactant gas intermittently inserted into the continuous flow of purge gas as a burst of reactant gas.

8. The method of claim 1, wherein the reactant gas used at the first deposition position is silane and the reactant gas used at the second deposition position is tungsten hexafluoride.

9. The method of claim 1, wherein the first direction is opposite the second direction.

10. A method of processing a substrate comprising:

supplying a plurality of gases to a multi-zone nozzle, where a different gas is supplied to each zone in a plurality of zones;

dispersing gas upon a substrate from each of the zones as the substrate moves beneath the multi-zone nozzle, where each of the gases contacts the substrate in a sequential order; and

flowing gas upwards between the zones.

11. The method of claim 10, wherein the plurality of zones comprises three zones.

12. The method of claim 10, wherein the step of dispersing gas in a sequential manner forms a layer through an atomic layer deposition.

13. The method of claim 10 further comprising supplying a gas mixture to the multi-zone nozzle and dispersing the gas mixture from one or more of the zones.

14. The method of claim 13, wherein dispersing the gas mixture forms a layer through a chemical vapor deposition process.

15. The method of claim 13, wherein dispersing the gas mixture forms a layer through an atomic layer deposition process.