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Interspinous process distraction implant and method of implantation

  • US 7,549,999 B2
  • Filed: 04/01/2004
  • Issued: 06/23/2009
  • Est. Priority Date: 05/22/2003
  • Status: Active Grant
First Claim
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1. A spinal implant comprising:

  • a spacer having a longitudinal axis and first and second end portions;

    said spacer further having an anterior edge and a posterior edge and elongated therebetween in a first direction generally transverse to said longitudinal axis;

    a first wing disposed proximate said first end portion and disposed generally transverse to said longitudinal axis;

    said first wing elongated from a posterior edge to an anterior edge thereof in said first direction;

    a distraction guide disposed more proximate said second end portion than said first end portion and tapering away from said first wing;

    a second wing disposed proximate said second end portion and said distraction guide, said second wing disposed generally transverse to said longitudinal axis and removably mounted to at least one of said spacer and said distraction guide;

    said second wing elongated from a posterior edge to an anterior edge thereof in said first direction;

    wherein the anterior and posterior edges of said spacer are generally rounded, said spacer further having generally linear surfaces disposed between said anterior and posterior edges disposed so as to diverge from each other toward said posterior edge so that said spacer creates a wedge narrowing in said first direction;

    wherein the spacer is rotatable about said longitudinal axis so as to be variably positioned rotationally relative to said first wing while said spacer is coupled to said first wing.

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