Process and structure for fabrication of MEMS device having isolated edge posts
First Claim
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1. An apparatus comprising an array of MEMS devices, the array comprising:
- a plurality of lower electrodes located over a substrate;
a plurality of upper strip electrodes spaced apart from the plurality of lower electrodes by a cavity, the upper strip electrodes separated by gaps;
a plurality of isolated edge posts located between the upper strip electrodes and the lower electrodes, wherein the isolated edge posts comprise a face extending along the edge of the isolated edge posts facing an adjacent gap; and
a reflective layer located under the plurality of upper strip electrodes on the same side of the cavity as the upper strip electrodes, wherein the reflective layer extends underneath at least a portion of the isolated edge posts.
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Abstract
A method of fabricating an array of MEMS devices includes the formation of support structures located at the edge of upper strip electrodes. A support structure is etched to form a pair of individual support structures located at the edges of a pair of adjacent electrodes. The electrodes themselves may be used as a hard mask during the etching of these support structures. A resultant array of MEMS devices includes support structures having a face located at the edge of an overlying electrode and coincident with the edge of the overlying electrode.
179 Citations
25 Claims
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1. An apparatus comprising an array of MEMS devices, the array comprising:
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a plurality of lower electrodes located over a substrate; a plurality of upper strip electrodes spaced apart from the plurality of lower electrodes by a cavity, the upper strip electrodes separated by gaps; a plurality of isolated edge posts located between the upper strip electrodes and the lower electrodes, wherein the isolated edge posts comprise a face extending along the edge of the isolated edge posts facing an adjacent gap; and a reflective layer located under the plurality of upper strip electrodes on the same side of the cavity as the upper strip electrodes, wherein the reflective layer extends underneath at least a portion of the isolated edge posts. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A MIEMS device, comprising:
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first means for electrically conducting; second means for electrically conducting; adjacent second means for electrically conducting; and supporting means for supporting edge portions of and for electrically isolating said second conducting means from said adjacent second conducting means wherein said second conducting means is electrically isolated from said first conducting means, and wherein said second conducting means is movable relative to said first conducting means in response to generating electrostatic potential between said first and second conducting means, and wherein said supporting means extends over and contacts at least a portion of said second conducting means, wherein the portion comprises a conductive material. - View Dependent Claims (22, 23)
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24. An apparatus comprising an array of MEMS devices, the array comprising:
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a plurality of lower electrodes located over a substrate; a plurality of upper strip electrodes spaced apart from the plurality of lower electrodes by a cavity, the upper strip electrodes separated by gaps, wherein the plurality of upper strip electrodes comprise nickel; a plurality of isolated edge posts located between the upper strip electrodes and the lower electrodes, wherein the isolated edge posts comprise a face extending along the edge of the isolated edge posts facing an adjacent gap.
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25. An apparatus comprising an array of MEMS devices, the array comprising:
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a plurality of lower electrodes located over a substrate; a plurality of upper strip electrodes spaced apart from the plurality of lower electrodes by a cavity, the upper strip electrodes separated by gaps; a plurality of isolated edge posts located between the upper strip electrodes and the lower electrodes, wherein the isolated edge posts comprise a face extending along the edge of the isolated edge posts facing an adjacent gap, and wherein the isolated edge posts comprise a material selected from the group of;
SiO2 and SiNx.
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Specification