Plasma processing member

• US 7,582,184 B2
• Filed: 02/24/2006
• Issued: 09/01/2009
• Est. Priority Date: 02/25/2005
• Status: Active Grant

• Current Assignee: NGK Insulators Limited
• Original Assignee: NGK Insulators Limited
• Inventors: Tsuruta, Hideyoshi, Tomita, Yasumitsu
• Primary Examiner(s): LUND, JEFFRIE ROBERT
• Application Number:
  US11/361,177
• Publication Number:
  US 20060191879A1
• Time in Patent Office: 1,285 Days
• Field of Search: 15634543-34547, 156/345.52, 118/715, 118/723.E, 118/725, 219/121.47, 315/111.21
• US Class Current: 156/345.43
• CPC Class Codes: H01J 2237/0206 Extinguishing, preventing or controlling unwanted discharges
• CPC Class Codes: H01J 37/32009 Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources plasma generation in general H05H1/24
• CPC Class Codes: H01J 37/32532 Electrodes
• CPC Class Codes: H01J 37/32577 Electrical connecting means

Abstract

A plasma processing member includes a ceramic base, a plasma generating electrode embedded in the ceramic base, and an electrode power supply member connected to the plasma generating electrode. The impedance of the plasma processing member when plasma is generated using high frequency power at a frequency higher than 13.56 MHz is adjusted to 25Ω or less.

Claims

1. A plasma processing member, comprising:

a ceramic base;

a plasma generating electrode embedded in the ceramic base; and

an electrode power supply member comprising a body portion, a top plate of the body portion, a bottom plate of the body portion and an external connecting portion joined to the body portion, wherein the body portion is connected to the plasma generating electrode, and wherein the body portion is hollow and has a diameter of 20 mm-80 mm;

an electrode terminal embedded in the ceramic base and connecting the plasma generating electrode and the body portion of the electrode power supply member;

a protection member formed of ceramic and including a housing portion accommodating the body portion of the electrode power supply member wherein the housing portion is joined to the ceramic base;

a resistance heating element embedded in the ceramic base;

a heating element power supply member connected to the resistance heating element; and

an insulating member formed of ceramic and including a housing portion accommodating the heating element power supply member,

wherein the body portion of the electrode power supply member is accommodated in the housing portion of the protection member, the external connecting portion of the electrode power supply member extends out of the protection member,

a first passage hole formed in the top plate of the body portion, and

a second passage hole formed in the bottom plate of the body portion,

the insulating member and the heating element power supply member are passed through the first passage hole, the hollow body portion of the electrode power supply member, and the second passage hole;

the impedance of the plasma processing member is not more than 25Ω

when plasma is generated using high frequency power at a frequency of at least 27 MHz, and

the electrode power supply member has an inductance of not more than 150 nH when plasma is generated using high frequency power at a frequency of at least 27 MHz.

2. The plasma processing member according to claim 1, wherein the plasma generating electrode and the electrode terminal are connected to each other by caulking, welding, brazing, soldering, fitting, or screwing, and the electrode terminal and the body portion of the electrode power supply member are connected to each other by caulking, welding, brazing, soldering, fighting, or screwing.