Apparatus and method for use of optical system with a plasma processing system

• US 7,591,923 B2
• Filed: 03/17/2005
• Issued: 09/22/2009
• Est. Priority Date: 09/30/2002
• Status: Expired due to Fees

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Mitrovic, Andrej S, Ludviksson, Audunn
• Primary Examiner(s): Cleveland; Michael
• Assistant Examiner(s): Ford; Nathan K
• Application Number:
  US11/082,223
• Publication Number:
  US 20050173375A1
• Time in Patent Office: 1,650 Days
• Field of Search: 118/723.MW
• US Class Current: 156/345.24
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge
• CPC Class Codes: H01J 37/32972 Spectral analysis

Abstract

A plasma processing system and method for operating an optical system in conjunction with a plasma processing system are provided. The plasma processing system includes an optical system in communication with a plasma processing chamber of the plasma processing system. The optical system has a window and is constructed and arranged to detect a plasma process condition through the window and a transmission condition of the window. The method includes detecting an optical emission from the plasma processing region and monitoring contamination of a window provided by the optical system.

Claims

1. A plasma processing system comprising:

a chamber having an opening and containing a plasma processing region;

a chuck, constructed and arranged to support a substrate within the chamber in the processing region;

a plasma generator in communication with the chamber, the plasma generator being constructed and arranged to generate a plasma during a plasma process in the plasma processing region; and

an optical system in communication with the chamber through the opening and having a window with one side facing the plasma processing region, the optical system being constructed and arranged to detect a plasma process condition through the window and a window transmission condition, wherein the window is configured to transmit a plasma optical emission formed into an incoming light beam by the optical system, the plasma processing condition being detected using the plasma optical emission, the optical system further comprising;

a transmission input lens mounted on the side of the window facing the plasma processing region, and configured to transmit a transmission detection beam from a light source through the window;

a transmission output lens mounted on the side of the window opposite the plasma processing region, and configured to receive the transmission detection beam for detecting the window transmission condition; and

a shutter valve positioned between the transmission input lens and the window along the optical axis of the transmission detection beam, the shutter valve being configured to protect the transmission input lens, but not the window, from contamination by the plasma when closed, and allow passage of the transmission detection beam when open,

wherein an optical axis of the transmission detection beam is positioned at an angle of less than 90°

with respect to an optical axis of the incoming light beam and such that the transmission detection beam does not traverse the plasma processing region, so that interference of the transmission detection beam and the incoming light beam is minimized allowing detection of the window transmission condition during detection of the plasma optical emission.

2. The plasma processing system of claim 1, wherein the plasma generator comprises an upper electrode and a lower electrode spaced from the upper electrode, the upper and lower electrodes being constructed and arranged to generate the plasma therebetween when power is supplied thereto.

3. The plasma processing system of claim 1, wherein the plasma generator is an antenna.

4. The plasma processing system of claim 1, wherein the optical system has an open area formed in a central portion thereof, the open area being configured to receive the window.

5. The plasma processing system of claim 4, wherein the optical system comprises one or more optical baffles positioned in the open area, the one or more optical baffles being configured to reduce interference between the transmission detection beam and the incoming light beam.

6. The plasma processing system of claim 4, wherein the optical system comprises a restrictor element disposed between the chamber and the optical system.

7. The plasma processing system of claim 6, wherein the restrictor element is configured to create a higher pressure of purge gas passed through the open area due to reduced flow conductance.

8. The plasma processing system of claim 6, wherein the window is sealingly mounted to an end of the restrictor element.

9. The plasma processing system of claim 1, further comprising a gate valve positioned between the chamber and the optical system, the gate valve being constructed and arranged to substantially isolate the optical system from the chamber.

10. The plasma processing system of claim 1, wherein the optical system includes a spectrometer for detection of at least the plasma optical emission and a signal collection lens constructed and arranged to collect and direct the plasma optical emission to the spectrometer.

11. The plasma processing system of claim 1, wherein the optical system is configured to correct the detected plasma optical emission based on the window transmission condition.

12. The plasma processing system of claim 1, further comprising a laser configured to emit laser light into the plasma processing region.

13. The plasma processing system of claim 12, wherein the optical system receives laser-excited plasma emissions.

14. The plasma processing system of claim 13, wherein the optical system is positioned transverse to the laser light.

15. The plasma processing system of claim 13, wherein the optical system includes an optical diagnostic system.

16. The plasma processing system of claim 12, further comprising a laser beam dump, external to the plasma processing chamber, configured to collect laser light after the laser light has passed through the plasma processing chamber.

17. An optical system adapted for a plasma processing system having a chamber containing a plasma processing region, the optical system comprising:

a signal collection portion having a window positioned therein with one side facing the plasma processing region, and being constructed and arranged to detect a plasma process condition through the window and a window transmission condition, wherein the window is configured to transmit a plasma optical emission formed into an incoming light beam by the optical system, the plasma processing condition being detected using the plasma optical emission;

a transmission input lens mounted on the side of the window facing the plasma processing region, and configured to transmit a transmission detection beam from a light source through the window;

a transmission output lens mounted on the side of the window opposite the plasma processing region, and configured to receive the transmission detection beam for detecting the window transmission condition; and

a shutter valve positioned between the transmission input lens and the window along the optical axis of the transmission detection beam, the shutter valve being configured to protect the transmission input lens, but not the window, from contamination by the plasma when closed, and allow passage of the transmission detection beam when open,

wherein an optical axis of the transmission detection beam is positioned at an angle of less than 90°

with respect to an optical axis of the incoming light beam and such that the transmission detection beam does not traverse the plasma processing region, so that interference of the transmission detection beam and the incoming light beam is minimized allowing detection of the window transmission condition during detection of the plasma optical emission.

18. The optical system of claim 17, wherein the signal collection portion has an open area formed in a central portion thereof the open area being configured to receive the window.

19. The optical system of claim 18, wherein the optical system comprises one or more optical baffles positioned in the open area, the one or more optical baffles being configured to reduce interference between the transmission detection beam and the incoming light beam.

20. The optical system of claim 18, further comprising a mounting portion mounted to the plasma processing region and a restrictor element.

21. The optical system of claim 20, wherein the window is sealingly mounted to an end of the restrictor element.

22. The optical system of claim 20, wherein the restrictor element is configured to create a higher pressure of purge gas passed through the open area due to reduced flow conductance.

23. The optical system of claim 17, wherein the optical system includes a spectrometer for detection of at least the plasma optical emission and a signal collection lens constructed and arranged to collect and direct the plasma optical emission to the spectrometer.

24. The optical system of claim 23, wherein the optical system is configured to correct the detected plasma optical emission based on the window transmission condition.