Lithographic apparatus, excimer laser and device manufacturing method

• US 7,595,863 B2
• Filed: 12/23/2005
• Issued: 09/29/2009
• Est. Priority Date: 12/23/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Kruif, Robertus Cornelis Martinus, Buurman, Erik Petrus, De Klerk, Johannes Wilhelmus, Bruls, Richard Joseph, Castenmiller, Thomas Josephus Maria
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US11/316,360
• Publication Number:
  US 20060146310A1
• Time in Patent Office: 1,376 Days
• Field of Search: 355/52, 355/53, 355/55, 355 67- 71, 356399-401, 250/548
• US Class Current: 355/69
• CPC Class Codes: G03F 7/70558 Dose control, i.e. achievement of a desired dose
• CPC Class Codes: G03F 7/70575 Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
• CPC Class Codes: G03F 7/70641 Focus

Abstract

A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and includes a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.

Claims

1. A lithographic apparatus comprising:

a radiation system configured to condition a beam of electro-magnetic radiation having a spectral distribution of radiant intensity;

a support structure configured to support a patterning device, the patterning device serving to impart the beam of radiation with a pattern in its cross-section, the pattern having a feature;

a substrate table configured to hold a substrate;

a projection system configured to expose a radiation sensitive portion of the substrate to the patterned beam of radiation; and

a controller configured and arranged to provide an adjustment of said spectral distribution of radiant intensity based at least on data relating to exposure at a first focal position and exposure at a second focal position and representing a corresponding first printed size and second printed size of the feature.

2. A lithographic apparatus according to claim 1, wherein the spectral distribution of radiant intensity comprises a spectral intensity peak having a bandwidth and wherein said adjustment comprises a change of the bandwidth.

3. A lithographic apparatus according to claim 2, wherein the spectral distribution of radiant intensity is a superposition of a first and a second peaked spectral intensity distribution having a respective equal first and second bandwidth, and a respective equal first and second intensity, and a respective first and second peak wavelength, and wherein the adjustment comprises a change of difference between the first and second peak wavelength.

4. A lithographic apparatus according to claim 1, wherein the spectral distribution of radiant intensity comprises a spectral intensity peak having, with respect to a center wavelength, a symmetric shape and wherein said adjustment comprises a change of the symmetric shape into an asymmetric shape with respect to the center wavelength.

5. A lithographic apparatus according to claim 2, wherein the data represent a difference between the corresponding first printed size and second printed size of the feature.

6. A lithographic apparatus according to claim 5, wherein the data further comprise a target difference between the corresponding first printed size and second printed size of the feature.

7. A lithographic apparatus according to claim 6, wherein the adjustment of said spectral distribution of radiant intensity is arranged to match the difference to the target difference.

8. A lithographic apparatus according to claim 7, wherein the target difference is a difference between the corresponding first printed size and second printed size of the feature, as printed using the patterning device on a supplementary lithographic apparatus.

9. A lithographic according to claim 1, wherein the radiation controller is configured to control a source of the beam of radiation.

10. A lithographic apparatus according to claim 1, wherein the spectral distribution of radiant intensity is a superposition of a first and a second peaked spectral intensity distribution having a respective first and second bandwidth, first and second peak wavelength, and first and second intensity, and wherein said adjustment comprises a change of one or more selected from:

a difference between the first and second peak wavelength and difference between the first and second bandwidth,

a difference between the first and second peak wavelength and difference between the first and second intensity, and/or

a difference between the first and second peak wavelength and difference between the first and second bandwidth and difference between the first and second intensity.

11. A lithographic apparatus according to claim 10, wherein the difference between the first and second peak wavelength is selected from the group consisting of between 0 and 1 pm.

12. A lithographic apparatus according to claim 1, wherein the spectral distribution of radiant intensity comprises a spectral intensity peak having a bandwidth and wherein the radiation system comprises an excimer laser to provide the beam of radiation and having a bandwidth-controller arranged to control the bandwidth and wherein the bandwidth-controller is constructed and arranged to adjust the bandwidth, a peak wavelength of the spectral intensity distribution, a shape of the spectral intensity distribution, and/or the bandwidth and the peak wavelength, in reaction to a user supplied signal representative for a respective selected bandwidth, peak wavelength, shape, and/or bandwidth and peak wavelength of the spectral distribution.

13. A lithographic apparatus according to claim 12, wherein the signal representative for a selected bandwidth of the spectral distribution is provided by the controller.

14. A device manufacturing method comprising:

providing a beam of electro-magnetic radiation having a spectral distribution of radiant intensity;

patterning the beam of radiation with a pattern in its cross-section using a patterning device, the pattern having a feature;

projecting the patterned beam of radiation to expose a radiation sensitive portion of a substrate; and

adjusting said spectral distribution of radiant intensity at least in part in accordance with data relating to exposure at a first focal position and exposure at a second focal position and representing a corresponding first printed size and second printed size of the feature.

15. A method according to claim 14, wherein the spectral distribution of radiant intensity comprises a spectral intensity peak having a bandwidth and wherein said adjusting comprises changing the bandwidth.

16. A method according to claim 14, wherein the spectral distribution of radiant intensity comprises a spectral intensity peak shaped symmetrically with respect to a center wavelength and wherein said adjusting comprises changing the spectral intensity peak into a spectral intensity peak shaped asymmetrically with respect to the center wavelength.

17. A method according to claim 15, wherein the data represent a difference between the corresponding first printed size and second printed size of the feature.

18. A method according to claim 17, wherein the data further comprise a target difference between the corresponding first printed size and second printed size of the feature.

19. A method according to claim 18, wherein the adjusting of said spectral distribution of radiant intensity comprises matching the difference to the target difference.

20. A method according to claim 19, wherein the target difference is a difference between the corresponding first printed size and second printed size of the feature, as printed using the patterning device on respectively a first lithographic apparatus and a second lithographic apparatus.

21. A method according to claim 14, wherein the adjusting is provided during one of a scanning exposure of a target portion on a substrate and a plurality of scanning exposures of a corresponding plurality of target portions on a substrate.