Non-planar surface structures and process for microelectromechanical systems

• US 7,623,287 B2
• Filed: 04/19/2006
• Issued: 11/24/2009
• Est. Priority Date: 04/19/2006
• Status: Expired due to Fees

• Current Assignee: Snaptrack Incorporated (Qualcomm, Inc.)
• Original Assignee: Qualcomm MEMS Technologies Incorporated (Qualcomm, Inc.)
• Inventors: Kogut, Lior, Sasagawa, Teruo, Tung, Ming-Hau
• Primary Examiner(s): Thompson; Timothy J
• Application Number:
  US11/406,866
• Publication Number:
  US 20070249079A1
• Time in Patent Office: 1,315 Days
• Field of Search: 430/321, 430/311, 359/290, 359/291
• US Class Current: 359/291
• CPC Class Codes: B81B 3/0008 Structures for avoiding electrostatic attraction, e.g. avoiding charge accumulation
• CPC Class Codes: G02B 26/001 based on interference in an adjustable optical cavity interference filters G02B5/28; devices or arrangements using multiple reflections in spectrometry or monochromators G01J3/26

Abstract

Methods of making MEMS devices including interferometric modulators involve depositing various layers, including stationary layers, movable layers and sacrificial layers, on a substrate. A non-planar surface is formed on one or more layers by flowing an etchant through a permeable layer. In one embodiment the non-planar surface is formed on a sacrificial layer. A movable layer formed over the non-planar surface of the sacrificial layer results in a non-planar interface between the sacrificial and movable layers. Removal of the sacrificial layer results in a released MEMS device having reduced contact area between the movable and stationary layers when the MEMS device is actuated. The reduced contact area results in lower adhesion forces and reduced stiction during actuation of the MEMS device. These methods may be used to manufacture released and unreleased interferometric modulators.

Claims

1. A method of making a microelectromechanical system (MEMS) device, comprising:

forming a permeable layer over an underlying layer material using a non-lithographic method, wherein the permeable layer comprises a masking material more resistant to removal by an etchant than the underlying layer material;

removing a portion of the underlying layer material by flowing the etchant through the permeable layer, thereby forming a non-planar surface on the remaining underlying layer material; and

depositing an overlying layer over the non-planer surface formed on the underlying layer to form a non-planar interface between the underlying layer and the overlying layer.

2. The method of claim 1, wherein the underlying layer material comprises at least one of glass and plastic.

3. The method of claim 1, further comprising removing substantially all of the permeable layer after removing the portion of the underlying layer.

4. The method of claim 1, wherein the underlying layer material comprises a metal.

5. The method of claim 1, wherein the underlying layer comprises a dielectric material.

6. The method of claim 1, wherein the permeable layer comprises aluminum.

7. A method of making a microelectromechanical system (MEMS) device, comprising:

providing a substrate;

depositing a sacrificial material over at least a portion of the substrate, the sacrificial material being removable by a first etchant;

forming a permeable layer over the sacrificial material using a non-lithographic method, wherein the permeable layer comprises a masking material more resistant to removal by the first etchant than the sacrificial material;

removing a portion of the sacrificial material by flowing the first etchant through the permeable layer, thereby forming a non-planar surface on the remaining sacrificial material; and

forming an electrically conductive layer over at least a portion of the non-planar surface.

8. The method of claim 7, wherein forming the permeable layer comprises flash depositing the masking material.

9. The method of claim 8, wherein the masking material comprises at least one of aluminum and aluminum oxide.

10. The method of claim 7, wherein forming the permeable layer comprises:

depositing a layer of aluminum over the sacrificial material; and

anodizing the layer of aluminum.

11. The method of claim 7, further comprising removing substantially all of the permeable layer after removing the portion of the sacrificial material.

12. The method of claim 11, wherein removing the permeable layer comprises:

selectively etching the permeable layer with a second etchant, the second etchant being more effective at removing the masking material than removing the sacrificial material.

13. The method of claim 7, further comprising forming a dielectric layer over the substrate, wherein the sacrificial material comprises a dielectric material of the dielectric layer.

14. The method of claim 7, further comprising removing substantially all of the remaining sacrificial material, thereby forming a cavity between the substrate and the electrically conductive layer.

15. The method of claim 7, wherein the substrate comprises a second electrically conductive layer.

16. The method of claim 15, wherein the second electrically conductive layer comprises indium tin oxide.

17. The method of claim 7, wherein forming the permeable layer comprises:

forming a continuous mask layer over the sacrificial material, the continuous mask layer comprising a plurality of regions configured to be removable at different relative rates; and

removing a portion of the continuous mask layer.

18. The method of claim 17, wherein removing the portion of the continuous mask layer comprises exposing the continuous mask layer to the first etchant.

19. The method of claim 17, wherein removing the portion of the continuous mask layer comprises exposing the continuous mask layer to a second etchant.

20. The method of claim 7, wherein the electrically conductive layer comprises a movable layer.

21. The method of claim 7, wherein the substrate comprises a partially reflective layer.

22. A method of making an interferometric modulator, comprising:

providing a substrate;

depositing a first electrically conductive layer over at least a portion of the substrate;

depositing a sacrificial material over at least a portion of the first electrically conductive layer, the sacrificial material being removable by an etchant;

forming a permeable layer over the sacrificial material using a non-lithographic method, wherein the permeable layer comprises a masking material;

removing a portion of the sacrificial material by flowing the etchant through the permeable layer, thereby forming a non-planar surface on the sacrificial material; and

forming a second electrically conductive layer over at least a portion of the non-planar surface.

23. The method of claim 22, wherein forming the permeable layer comprises flash depositing the masking material.

24. The method of claim 23, wherein the masking material comprises at least one of aluminum and aluminum oxide.

25. The method of claim 22, wherein forming the permeable layer comprises:

depositing a layer of aluminum over the sacrificial material; and

anodizing the layer of aluminum.

26. The method of claim 22, further comprising removing substantially all of the permeable layer after removing the portion of the sacrificial material.

27. The method of claim 22, further comprising forming a dielectric layer over the first electrically conductive layer.

28. The method of claim 27, wherein the sacrificial material comprises a dielectric material of the dielectric layer.

29. The method of claim 27, further comprising depositing the sacrificial material over the dielectric layer.

30. The method of claim 22, wherein the first electrically conductive layer comprises indium tin oxide.

31. The method of claim 22, wherein the second electrically conductive layer comprises a movable layer.

32. The method of claim 22, wherein forming the permeable layer comprises:

forming a continuous mask layer over the sacrificial material, the continuous mask layer comprising a plurality of regions configured to be removable at different relative rates; and

removing a portion of the continuous mask layer.

33. The method of claim 32, wherein removing the portion of the continuous mask layer comprises exposing the continuous mask layer to the etchant.

34. The method of claim 32, wherein removing the portion of the continuous mask layer comprises exposing the continuous mask layer to a second etchant.

35. The method of claim 22, further comprising removing a substantial portion of the permeable layer while removing the portion of the sacrificial material.

36. The method of claim 22, further comprising:

forming a support structure aperture in a portion of the deposited sacrificial material; and

depositing an insulator into the support structure aperture.

37. An unreleased interferometric modulator made by the method of claim 22.

38. The method of claim 22, further comprising removing substantially all of the remaining sacrificial material, thereby forming a cavity between the substrate and the electrically conductive layer.

39. A released interferometric modulator made by the method of claim 38.