Methods and systems to compensate for a stitching disturbance of a printed pattern
First Claim
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1. A method of using a patterning device, comprising:
- (a) performing a first exposure of a surface corresponding to image data, wherein the first exposure occurs during a first pass of the patterning device with respect to the surface to produce a first image on the surface;
(b) determining an image deficiency caused by step (a) within a region of the first image;
(c) adjusting the image data to compensate for the image deficiency; and
(d) performing a second exposure of the surface corresponding to the adjusted image data during a second pass of the patterning device with respect to the surface to correct the image deficiency.
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Abstract
A method and system are provided of using a patterning device. An exemplary method includes performing a first exposure of a surface corresponding to image data, determining an image deficiency within a region of the first image, adjusting the image data to compensate for the image deficiency, and performing a second exposure of the surface corresponding to the adjusted image data during a second pass of the patterning device with respect to the surface. The first exposure occurs during a first pass of the patterning device with respect to the surface to produce a first image on the surface.
46 Citations
19 Claims
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1. A method of using a patterning device, comprising:
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(a) performing a first exposure of a surface corresponding to image data, wherein the first exposure occurs during a first pass of the patterning device with respect to the surface to produce a first image on the surface; (b) determining an image deficiency caused by step (a) within a region of the first image; (c) adjusting the image data to compensate for the image deficiency; and (d) performing a second exposure of the surface corresponding to the adjusted image data during a second pass of the patterning device with respect to the surface to correct the image deficiency. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. An apparatus, comprising:
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a patterning device configured to expose a surface using image data; and a controller configured adjust the image data to compensate for an image deficiency, wherein the image deficiency occurs as result of a first exposure, wherein the controller is configured to direct the patterning device to perform a second exposure using the adjusted image data to correct for the image deficiency. - View Dependent Claims (11, 12, 13, 14)
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15. A computer-readable medium containing instructions for controlling a processor to control a patterning device by a method comprising:
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(a) performing a first exposure of a surface corresponding to image data, wherein the first exposure occurs during a first pass of the patterning device with respect to the surface to produce a first image on the surface; (b) determining an image deficiency caused by step (a) within a region of the first image; (c) adjusting the image data to compensate for the image deficiency; and (d) performing a second exposure of the surface corresponding to the adjusted image data during a second pass of the patterning device with respect to the surface to correct the image deficiency. - View Dependent Claims (16, 17, 18, 19)
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Specification