System to transfer a template transfer body between a motion stage and a docking plate
First Claim
1. A transfer system of an imprint lithography system, the imprint lithography system operable for imprinting a pattern into a material deposited between an imprint template and a substrate, comprising:
- a docking system positioned on a stage support of the imprint lithography system;
a motion stage having a substrate chuck for holding said substrate, said motion stage positioned on said stage support of said imprint lithography system and spaced-apart from said docking system a first distance, said motion stage having a range of motion associated therewith, with a periphery of said range of motion being spaced-apart from said docking system said first distance; and
a body positioned on said stage support of said imprint lithography system, having first and second opposed sides spaced-apart a second distance, selectively coupled between said docking system and said motion stage, with said first distance being greater than said second distance to minimize a probability of a collision between any of said docking system, said motion stage, and said body while transferring said body between said docking system and said motion stage, said body having at least one component device positioned thereon.
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Accused Products
Abstract
The present is directed towards an imprint lithography system including, inter alia, a docking plate; a motion stage having a range of motion associated therewith, the range of motion having a periphery spaced-apart from the docking plate a first distance; and a body, having first and second opposed sides spaced-apart a second distance, selectively coupled between the docking plate and the motion stage, the first distance being greater than the second distance to minimize a probability of a collision between the docking plate, the motion stage and the body while transferring the body between the docking plate and the motion stage.
137 Citations
23 Claims
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1. A transfer system of an imprint lithography system, the imprint lithography system operable for imprinting a pattern into a material deposited between an imprint template and a substrate, comprising:
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a docking system positioned on a stage support of the imprint lithography system; a motion stage having a substrate chuck for holding said substrate, said motion stage positioned on said stage support of said imprint lithography system and spaced-apart from said docking system a first distance, said motion stage having a range of motion associated therewith, with a periphery of said range of motion being spaced-apart from said docking system said first distance; and a body positioned on said stage support of said imprint lithography system, having first and second opposed sides spaced-apart a second distance, selectively coupled between said docking system and said motion stage, with said first distance being greater than said second distance to minimize a probability of a collision between any of said docking system, said motion stage, and said body while transferring said body between said docking system and said motion stage, said body having at least one component device positioned thereon. - View Dependent Claims (2, 4, 5, 6, 7, 8, 9, 22, 23)
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3. A transfer system of an imprint lithography system, said imprint lithography system operable for imprinting a pattern into a material deposited between an imprint template and a substrate comprising:
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a docking system, said docking system positioned on a stage support of said imprint lithography system; a motion stage positioned on said stage support of said imprint lithography system and spaced-apart from said docking system a first distance, said motion stage having a range of motion associated therewith, with a periphery of said range of motion being spaced-apart from said docking system said first distance; and a body positioned on said stage support of said imprint lithography system and having first and second opposed sides spaced-apart a second distance, selectively coupled between said docking system and said motion stage, with said first distance being greater than said second distance to minimize a probability of a collision between any of said docking system, said motion stage, and said body while transferring said body between said docking system and said motion stage, wherein said docking system comprises a docking body and a docking plate having an arm coupled therebetween, said arm having an additional range of motion associated therewith, with a periphery of said additional range of motion being spaced-apart from said docking system a third distance, with said third distance being a difference between said first and second distances.
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10. A transfer system for use in an imprint lithography system, said imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate comprising:
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a docking system positioned on a stage support; a motion stage positioned on said stage support and spaced-apart from said docking system a first distance, said motion stage having a range of motion associated therewith, with a periphery of said range of motion being spaced-apart from said docking system said first distance; and a body positioned on a stage support, having first and second opposed sides spaced-apart a second distance, selectively coupled between said docking system and said motion stage, with said first distance being greater than said second distance to minimize a kinetic energy present while transferring said body between said docking system and said motion stage, said body having at least one component device positioned thereon for use in said imprint lithography system. - View Dependent Claims (11, 13, 14, 15)
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12. A transfer system of an imprint lithography system, said imprint lithography system operable for imprinting a pattern into a material deposited between an imprint template and a substrate comprising:
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a docking system, said docking system positioned on a stage support of said imprint lithography system; a motion stage positioned on said stage support of said imprint lithography system and spaced-apart from said docking system a first distance, said motion stage having a range of motion associated therewith, with a periphery of said range of motion being spaced-apart from said docking system said first distance; and a body positioned on said stage support of said imprint lithography system and having first and second opposed sides spaced-apart a second distance, selectively coupled between said docking system and said motion stage, with said first distance being greater than said second distance to minimize a kinetic energy present while transferring said body between said docking system and said motion stage, wherein said docking system comprises a docking body and a docking plate having an arm coupled therebetween, said arm having an additional range of motion associated therewith, with a periphery of said additional range of motion being spaced-apart from said docking system a third distance, with said third distance being a difference between said first and second distances.
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16. An imprint lithography system comprising:
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a docking system positioned on a stage support, said docking system comprising a docking body and a docking plate having an arm coupled therebetween, said arm in communication with a motor to position said docking plate between first and second positions, said second position being spaced-apart from said docking body a first distance; a motion stage positioned on said stage support and spaced-apart from said docking system a second distance, said motion stage having a range of motion associated therewith, with a periphery of said range of motion being spaced-apart from said docking system said second distance; and a body positioned on said stags support and selectively coupled between said docking system and said motion stage, with said first and second distances being established to minimize a probability of a collision between any of said docking system, said motion stage and said body while transfening said body between said docking system and said motion stage, said body having a component device positioned thereon for use in said imprint lithography system. - View Dependent Claims (17, 18, 19, 20, 21)
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Specification