RF plasma supply device

• US 7,745,955 B2
• Filed: 10/16/2006
• Issued: 06/29/2010
• Est. Priority Date: 10/17/2005
• Status: Active Grant

• Current Assignee: Hüttinger Elektronik GmbH + Co. KG
• Original Assignee: Hüttinger Elektronik GmbH + Co. KG
• Inventors: Mann, Ekkehard, Gluck, Michael, Hofstetter, Christoph, Hintz, Gerd, Gerhardt, Christoph, Kirchmeier, Thomas
• Primary Examiner(s): PALADINI, ALBERT WILLIAM
• Application Number:
  US11/549,773
• Publication Number:
  US 20070145900A1
• Time in Patent Office: 1,352 Days
• Field of Search: 307/154, 307 43- 45, 118/723.E, 313/231.31, 361/235
• US Class Current: 307/44
• CPC Class Codes: H01J 37/32082 Radio frequency generated discharge H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence
• CPC Class Codes: H01J 37/32165 Plural frequencies
• CPC Class Codes: H01J 37/32174 Circuits specially adapted for controlling the RF discharge
• CPC Class Codes: H02M 7/5387 in a bridge configuration
• CPC Class Codes: H02M 7/53878 by time shifting switching signals of one diagonal pair of the bridge with respect to the other diagonal pair

Abstract

The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.

Claims

1. A method for controlling the power output of an RF plasma supply device, the method comprising:

producing at least a first and a second RF power signal;

coupling at least two RF power signals into a coupled RF power in dependence on the RF power signals;

distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load; and

adjusting the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.

2. The method of claim 1 wherein an insignificant portion of the coupled RF power is less than about 10% of the coupled RF power.

3. The method of claim 1 wherein a significant portion of the coupled RF power is greater than about 10% of the coupled RF power.

4. The method of claim 1, wherein adjusting the RF power signals includes adjusting levels, phase position, or both levels and phase position of the RF power signals.

5. The method of claim 1, wherein, for plasma power in the range between the predefined lower power limit and the predefined nominal power, an equalizing power is set that is lower than the equalizing power set for plasma power below the predefined lower power limit.

6. The method of claim 1 wherein adjusting the RF power signals includes adjusting the direct current supply, the direct voltage supply, or both the direct current supply and the direct voltage supply of RF power generators that produce the RF power signals.

7. The method of claim 1, wherein producing the RF power signals includes driving switching elements in RF generators.

8. The method of claim 7, wherein adjusting the RF power signals includes driving the switching elements in a phase-shift method.

9. The method of claim 1, further comprising:

coarsely adjusting the coupled RF power by controlling the direct current supply, the direct voltage supply, or both the direct current supply and the direct voltage supply of RF generators that produce the RF power signals, and

finely adjusting the coupled RF power by carrying out a phase-shift control operation of the RF generators.

10. The method of claim 1, wherein coupling the RF power signals includes coupling the RF power signals in a 90°

hybrid.

11. The method of claim 10, wherein coupling the RF power signals includes coupling the RF power signals in a 3 dB coupler.

12. The method of claim 1, wherein:

producing at least a first and a second RF power signal includes producing more than two RF power signals, and

coupling at least two RF power signals into a coupled RF power includes coupling two of the RF power signals into a first coupled RF power signal and coupling the first coupled RF power signal with a third signal into a load coupled RF power signal that provides the coupled RF power.

13. The method of claim 12, wherein coupling the first coupled RF power signal with a third signal includes coupling the first coupled RF power signal with a third RF power signal.

14. The method of claim 1, further comprising producing a plurality of equalizing power levels for a plurality of equalizing loads.

15. The method of claim 1, wherein coupling the RF power signals includes adding the RF power signals in coupling members.

16. The method of claim 15, wherein the coupling members are arranged in a cascading manner.

17. The method of claim 1, further comprising measuring a variable that describes an RF power.

18. The method of claim 17, wherein adjusting the RF power signals includes using the variable that describes the RF power.

19. The method of claim 1, further comprising impedance matching the plasma power that is to be supplied to the plasma load.

20. An RF plasma supply device for supplying a plasma load with plasma power, the device comprising:

at least two RF generators for producing a first and a second RF power signal,

at least one coupling member in which a coupled RF power is produced from the RF power signals, and having a first output connected to the plasma load and a second output connected to an equalizing load, and

a control device coupled to the RF generators to control the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power is distributed to the equalizing load and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power is distributed to the equalizing load.

21. The RF plasma supply device of claim 20, wherein the at least one coupling member includes an input that is directly coupled to one of the RF power signals.

22. The RF plasma supply device of claim 20, wherein the at least one coupling member includes an input that is directly coupled to an output of another coupling member that includes an input that is directly coupled to one of the RF power signals.

23. The RF plasma supply device of claim 20, wherein the coupling member is a 90°

hybrid.

24. The RF plasma supply device of claim 20, wherein the coupling member is a 3 dB coupler.

25. The RF plasma supply device of claim 20, wherein the RF plasma power supply device includes:

more than two RF generators for producing more than two RF power signals, and

at least two coupling members that are arranged in a cascading manner.

26. The RF plasma supply device of claim 20, further comprising at least one measuring device for measuring a variable that describes an RF power.

27. The RF plasma supply device of claim 20, further comprising at least one DC power supply coupled to the RF generators and the control device.