Reverse optical mastering for data storage disk replicas

• US 7,801,016 B2
• Filed: 09/04/2009
• Issued: 09/21/2010
• Est. Priority Date: 04/06/1998
• Status: Expired due to Fees

• Current Assignee: Max Blu Technologies, LLC (IP Investments Group LLC)
• Original Assignee: Imation Corporation (Glassbridge Enterprises, Inc.)
• Inventors: Edwards, Jathan D., Kerfeld, Donald J.
• Primary Examiner(s): HUBER, PAUL W
• Application Number:
  US12/584,454
• Publication Number:
  US 20100067360A1
• Time in Patent Office: 382 Days
• Field of Search: None
• US Class Current: 369/275.4
• CPC Class Codes: G11B 23/0085 intermediate mediums using a photosensitive material, e.g. photo-resist
• CPC Class Codes: G11B 7/24 Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the arrangement of information on the carrier G11B7/007
• CPC Class Codes: G11B 7/24091 Combinations of pits and tracks with specific interrelation
• CPC Class Codes: G11B 7/261 Preparing a master, e.g. exposing photoresist, electroforming
• CPC Class Codes: G11B 7/263 Preparing and using a stamper, e.g. pressing or injection molding substrates production of optical record carriers, e.g. optical discs B29D17/005
• CPC Class Codes: Y10S 425/81 Sound record

Abstract

A data storage master disk and method of making a data storage master disk. The data storage disk master is for use in a data storage disk replication process. The data storage disk molding processes produces replica disks having a surface relief pattern with replica lands and replica grooves. The method includes providing a master substrate. The master substrate is at least partially covered with a layer of photosensitive material. A surface relief pattern having master lands and master grooves is recorded in the data storage disk master, including the steps of exposing and developing the photosensitive material is controlled to form master grooves extending down to a substrate interface between the master substrate and the layer of photosensitive material, such that the width of the master grooves at the substrate interface corresponds to a desired width of the replica lands.

Claims

1. A replica disk comprising:

a replica substrate including a first major surface and a second major surface, the first major surface including a surface pattern defined by lands and interrupted grooves,

wherein the surface pattern defines a track pitch that is less than 425 nanometers,

wherein tops of the lands define widths between 25 percent of the track pitch and 140 nanometers, and

wherein the grooves define depths between 20 and 120 nanometers.

2. The replica disk of claim 1, wherein the widths of the tops of the lands are greater than 35 percent of the track pitch.

3. The replica disk of claim 1, wherein the tops of the lands are substantially flat and coplanar.

4. The replica disk of claim 3, wherein the widths of the tops of the lands are greater than 35 percent of the track pitch.

5. The replica disk of claim 1, wherein the depths of the grooves are between 55 and 110 nanometers.

6. The replica disk of claim 5, wherein the tops of the lands are substantially flat and coplanar.

7. The replica disk of claim 5, wherein the widths of the tops of the lands are greater than 35 percent of the track pitch.

8. The replica disk of claim 7, wherein the tops of the lands are substantially flat and coplanar.