Optical emission interferometry for PECVD using a gas injection hole
First Claim
1. A plasma apparatus for processing a substrate comprising:
- a vacuum chamber;
at least one power supply for generating the plasma in said vacuum chamber;
a substrate pedestal for supporting the substrate;
an upper electrode assembly having a viewport and a gas distribution system having a showerhead having a plurality of standard showerhead holes;
a detector in optical communication with optical components, said optical components being positioned within said viewport above said showerhead, said optical components only exposed to non-reacted process gas, said optical components in optical communication with at least one of said standard showerhead holes, said optical components collecting plasma emission transmitted through said standard showerhead holes, said detector monitoring the collected plasma emission transmitted through said standard showerhead holes; and
a control system in electrical communication with said detector and said power supply.
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Accused Products
Abstract
The present invention provides a method and apparatus for improving optical sensing of a plasma process through the use of a fiber optic sensor placed within a standard showerhead hole of a standard gas showerhead positioned in an upper electrode of a plasma system during the plasma processing of a substrate. A film property can be calculated based on the measured plasma emission from the surface of the substrate. The film property can be film deposition rate, refractive index, film thickness, etc. Based on the measured film property, the plasma processing of the substrate can be adjusted and/or terminated. In addition, a window is provided that is positioned in the upper electrode assembly for viewing the plasma emission through the standard showerhead hole.
44 Citations
8 Claims
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1. A plasma apparatus for processing a substrate comprising:
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a vacuum chamber; at least one power supply for generating the plasma in said vacuum chamber; a substrate pedestal for supporting the substrate; an upper electrode assembly having a viewport and a gas distribution system having a showerhead having a plurality of standard showerhead holes; a detector in optical communication with optical components, said optical components being positioned within said viewport above said showerhead, said optical components only exposed to non-reacted process gas, said optical components in optical communication with at least one of said standard showerhead holes, said optical components collecting plasma emission transmitted through said standard showerhead holes, said detector monitoring the collected plasma emission transmitted through said standard showerhead holes; and a control system in electrical communication with said detector and said power supply. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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Specification
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- Resources
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Current AssigneePlasma-Therm Corporation
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Original AssigneePlasma-Therm Corporation
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InventorsJohnson, David
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Primary Examiner(s)Vinh; Lan
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Application NumberUS11/502,585Publication NumberTime in Patent Office1,559 DaysField of Search156/345.33, 156/345.34, 156/345.39, 156/345.4, 156/345.24, 156/345.25, 438/7, 438/710US Class Current156/345.25CPC Class CodesC23C 16/52 Controlling or regulating t...G01B 11/0658 with measurement of emissiv...G01B 11/0683 measurement during depositi...H01J 37/32935 Monitoring and controlling ...H01J 37/32972 Spectral analysis
