Immersion exposure apparatus and device manufacturing method with liquid detection apparatus
First Claim
1. An exposure apparatus comprising:
- a substrate stage on which a substrate is held, the substrate stage being movable while holding the substrate;
a projection optical system through which an image of a pattern is projected onto the substrate held by the substrate stage when the substrate is disposed adjacent to a final optical element of the projection optical system, a liquid being provided in a space between the final optical element and the substrate so as to contact the final optical element and the substrate; and
a detection apparatus that detects whether the liquid is present on an object that is disposed lower than the final optical element of the projection optical system at a time when the image of the pattern is projected by the projection optical system onto the substrate, the object being at least one of the substrate stage, the substrate and a member that moves with the substrate stage.
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Accused Products
Abstract
An exposure apparatus for exposing a substrate by emitting exposure light thereto through a projection optical system and liquid, has a detection apparatus that detects whether the liquid is present on an object disposed lower than a front end of the projection optical system. Another detection apparatus has an emitting portion that emits detection light to an immersion area between the projection optical system and an object disposed on an image plane side thereof, and a light-receiving portion disposed at a predetermined position for the detection light; therein, at least one of size and shape of the immersion area is obtained based on light receiving results. The detection apparatus is used to detect the presence of liquid on such lower-disposed object, the state of the immersion area, or shape or contact angle of the liquid. Optimal measures are taken, based on detection results, for maintaining high exposure and measurement accuracies.
164 Citations
23 Claims
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1. An exposure apparatus comprising:
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a substrate stage on which a substrate is held, the substrate stage being movable while holding the substrate; a projection optical system through which an image of a pattern is projected onto the substrate held by the substrate stage when the substrate is disposed adjacent to a final optical element of the projection optical system, a liquid being provided in a space between the final optical element and the substrate so as to contact the final optical element and the substrate; and a detection apparatus that detects whether the liquid is present on an object that is disposed lower than the final optical element of the projection optical system at a time when the image of the pattern is projected by the projection optical system onto the substrate, the object being at least one of the substrate stage, the substrate and a member that moves with the substrate stage. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
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Specification
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- Resources
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Current AssigneeNikon Corporation
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Original AssigneeNikon Corporation
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InventorsHoriuchi, Takashi, Takaiwa, Hiroaki
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Primary Examiner(s)Kim; Peter B
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Assistant Examiner(s)LIU, MICHAEL
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Application NumberUS10/587,268Publication NumberTime in Patent Office2,377 DaysField of Search355/30, 355/53, 355/55, 355/67US Class Current355/30CPC Class CodesG03B 27/42 for automatic sequential co...G03F 7/70341 Details of immersion lithog...G03F 7/7085 Detection arrangement, e.g....G03F 7/70916 Pollution mitigation, i.e. ...
