Method of making a scratch-and etch-resistant coated glass article

• US 8,003,164 B2
• Filed: 09/19/2008
• Issued: 08/23/2011
• Est. Priority Date: 09/19/2008
• Status: Active Grant

• Current Assignee: Guardian Glass LLC (KOCH Industries Incorporated)
• Original Assignee: Guardian Industries Corporation (KOCH Industries Incorporated)
• Inventors: Fisher, Greg, Frati, Maxi, Nunez-Regueiro, Jose, Petrmichl, Rudolph Hugo, Remington, Michael P. Jr.
• Primary Examiner(s): Chen; Bret
• Application Number:
  US12/232,616
• Publication Number:
  US 20100075157A1
• Time in Patent Office: 1,068 Days
• Field of Search: 427/163.1, 427/165, 427/166, 427/255.31, 427/255.394, 427/255.7, 427/595
• US Class Current: 427/165
• CPC Class Codes: C03C 17/3441 comprising carbon, a carbide or oxycarbide
• CPC Class Codes: C03C 17/3452 comprising a fluoride

Abstract

A method of making a scratch resistant coated article which is also resistant to attacks by at least some fluorine-inclusive etchant(s) for at least a period of time is provided. In certain example embodiments, an anti-etch layer(s) is provided on a glass substrate in order to protect the glass substrate from attacks by fluorine-inclusive etchant(s), a scratch resistant layer of or including DLC is provided over the anti-layer(s), and a seed layer is provided between the anti-layer(s) and the scratch resistant layer so as to facilitate the adhesion of the scratch resistant layer while also helping to protect the anti-layer(s). Optionally, a base layer(s) or underlayer(s) may be provided under at least the anti-etch layer(s).

Claims

1. A method of making a coated article, the method comprising:

providing a glass substrate;

forming an anti-etch layer on the glass substrate, the anti-etch layer consisting essentially of fluorine-doped tin oxide;

ion beam depositing a scratch-resistant layer comprising diamond-like carbon (DLC) on the glass substrate over the anti-etch layer; and

forming a seed layer between the anti-etch layer and the layer comprising DLC, the seed layer facilitating adhesion of the layer comprising DLC and/or protecting the anti-etch layer from damage during the ion beam depositing of the layer comprising DLC.

2. The method of claim 1, wherein the seed layer comprises silicon nitride.

3. The method of claim 1, wherein the anti-etch layer is deposited via flame pyrolysis, combustion vapor deposition, flame deposition, or spray pyrolysis.

4. The method of claim 1, further comprising forming a base layer or underlayer on the glass substrate,

wherein the anti-etch layer is deposited over the base layer or underlayer.

5. The method of claim 4, wherein the base layer or underlayer is a low-E color suppression layer stack.

6. The method of claim 5, wherein the low-E color suppression layer stack comprises a layer of tin oxide on the glass substrate and a layer of silicon oxide provided on the tin oxide opposite the glass substrate.

7. The method of claim 1, wherein the coated article is a window.

8. The method of claim 1, wherein the coated article has a visible transmission of at least about 50%.

9. The method of claim 1, wherein the anti-etch layer is resistant to fluorine-inclusive etchants.

10. The method of claim 1, further comprising forming a base layer or underlayer on the glass substrate,

wherein the anti-etch layer is deposited over the base layer or underlayer, and

wherein the seed layer comprises silicon nitride.

11. The method of claim 1, wherein the anti-etch layer is about 150-350 nm thick,

wherein the seed layer is about 1-5 nm thick, and

wherein the layer comprising DLC is about 3-5 nm thick.

12. A method of making a coated article, the method comprising:

providing a glass substrate;

forming a base layer or underlayer on the glass substrate;

forming an anti-etch layer over the base layer or underlayer, the anti-etch layer comprising at least one of fluorine-doped tin oxide and cerium oxide;

ion beam depositing a layer comprising diamond-like carbon (DLC) on the glass substrate over the anti-etch layer; and

forming a seed layer between and contacting both the anti-etch layer and the layer comprising DLC, the seed layer comprising silicon nitride.

13. The method of claim 12, further comprising facilitating, via the seed layer, the ion beam depositing of the layer comprising DLC.

14. The method of claim 12, wherein the seed layer helps protect the anti-etch layer from damage during the ion beam depositing of the layer comprising DLC.

15. The method of claim 12, wherein the base layer or underlayer is a low-E layer stack.

16. The method of claim 15, wherein the low-E layer stack comprises a layer of tin oxide on the glass substrate and a layer of silicon oxide provided on the tin oxide opposite the glass substrate.

17. The method of claim 12, wherein the coated article has a visible transmission of at least about 50%.

18. The method of claim 12, wherein the anti-etch layer is resistant to fluorine-inclusive etchants.

19. The method of claim 12, wherein the anti-etch layer consists essentially of fluorine-doped tin oxide.