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Method for producing display device

  • US 8,012,782 B2
  • Filed: 07/28/2010
  • Issued: 09/06/2011
  • Est. Priority Date: 03/18/1995
  • Status: Expired due to Fees
First Claim
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1. A method of manufacturing a semiconductor device comprising:

  • forming a peeling layer over a first substrate;

    forming a base film over the peeling layer;

    forming a semiconductor device including a thin film transistor over the base film, wherein the thin film transistor comprises a semiconductor film, a gate electrode, a gate insulating film, and a first electrode electrically connected to the semiconductor film;

    sticking a second substrate having a second electrode over the first substrate so as to electrically connect the second electrode with the first electrode; and

    separating the first substrate from the semiconductor device at the peeling layer.

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