Structure including a graphene layer and method for forming the same
First Claim
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1. A method for forming a graphene layer, the method comprising:
- establishing an insulating layer on a substrate such that at least one seed region is formed therein, the insulating layer including a first surface that faces the substrate and a second surface opposed to the first surface that faces away from the substrate; and
exposing a seed material in the at least one seed region to a carbon-containing precursor gas, thereby initiating nucleation of the graphene layer on the seed material and enabling lateral growth of the graphene layer along at least a portion of the second surface of the insulating layer.
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Abstract
A method for forming a graphene layer is disclosed herein. The method includes establishing an insulating layer on a substrate such that at least one seed region, which exposes a surface of the substrate, is formed. A seed material in the seed region is exposed to a carbon-containing precursor gas, thereby initiating nucleation of the graphene layer on the seed material and enabling lateral growth of the graphene layer along at least a portion of a surface of the insulating layer.
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21 Claims
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1. A method for forming a graphene layer, the method comprising:
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establishing an insulating layer on a substrate such that at least one seed region is formed therein, the insulating layer including a first surface that faces the substrate and a second surface opposed to the first surface that faces away from the substrate; and exposing a seed material in the at least one seed region to a carbon-containing precursor gas, thereby initiating nucleation of the graphene layer on the seed material and enabling lateral growth of the graphene layer along at least a portion of the second surface of the insulating layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A structure, comprising:
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a substrate; an insulating layer established on the substrate, the insulating layer including; at least one seed region formed therein;
a first surface facing the substrate; and
a second surface opposed to the first surface and facing away from the substrate;a seed material located at the at least one seed region; and a graphene layer extending from the seed material laterally along at least a portion of the second surface of the insulating layer. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19)
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20. A structure, comprising:
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a substrate; an insulating layer established on the substrate, the insulating layer including at least one seed region formed therein, the at least one seed region having two opposed sides; a seed material located at the at least one seed region; and a graphene layer extending from the seed material laterally along at least a portion of a surface of the insulating layer; a growth limiting feature formed in or on the insulating layer directly adjacent to or a spaced distance from one of the two opposed sides of the at least one seed region; wherein the growth limiting feature includes a recess in the insulating layer, and wherein the recess renders the graphene layer non-contiguous. - View Dependent Claims (21)
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Specification