Interspinous process implant and method of implantation
First Claim
1. An interspinous implant adapted to be inserted between spinous processes, the implant comprising:
- an interspinous spacer, including;
a main portion having a recess;
an expansion portion movable relative to the main portion between a retracted configuration relatively closer to the main portion and a deployed configuration relatively farther from the main portion, wherein the expansion portion is disposed at least partially in the recess in the retracted configuration;
an insert-receiving cavity disposed between the expansion portion and the main portion;
an insert selectively matable with the spacer;
wherein, with the insert disposed in the insert-receiving cavity, the insert urges the expansion portion away from the main portion to the deployed configuration;
wherein a larger amount of the expansion portion is disposed within the recess in the retracted configuration than in the deployed configuration.
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Accused Products
Abstract
Systems and method in accordance with embodiments of the present invention can includes an implant having a spacer with an expandable portion. An insert can be positioned within a groove of the spacer to distract the expandable portion away from the main portion of the spacer. The expandable portion can optionally include a grip that can at least partially deform to conform to a contour of a spinous process to provide a frictional grip to prevent the implant from shifting position. Implants in accordance with the present invention can also include a binder that can be arranged around the adjacent spinous processes to limit flexion movement.
642 Citations
16 Claims
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1. An interspinous implant adapted to be inserted between spinous processes, the implant comprising:
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an interspinous spacer, including; a main portion having a recess; an expansion portion movable relative to the main portion between a retracted configuration relatively closer to the main portion and a deployed configuration relatively farther from the main portion, wherein the expansion portion is disposed at least partially in the recess in the retracted configuration; an insert-receiving cavity disposed between the expansion portion and the main portion; an insert selectively matable with the spacer; wherein, with the insert disposed in the insert-receiving cavity, the insert urges the expansion portion away from the main portion to the deployed configuration; wherein a larger amount of the expansion portion is disposed within the recess in the retracted configuration than in the deployed configuration. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. An interspinous implant adapted to be inserted between spinous processes, the implant comprising:
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a distraction guide; an interspinous spacer, including; a main portion connected with the distraction guide;
the main portion having a recess;an expansion portion associated with the main portion and moveable relative thereto between a retracted configuration and a deployed configuration;
the expansion portion capable of being urged away from the main portion;a first wing connected with the main portion and disposed transverse to the main portion; wherein the main portion has a longitudinal axis and wherein the first wing and the distraction guide are disposed on opposing longitudinal sides of the main portion; wherein the expansion portion has lateral end surfaces extending transverse to the longitudinal axis of the main portion;
the lateral end surfaces being longitudinally end-most portions of the expansion portion;wherein the lateral end surfaces are longitudinally bounded by the recess when the expansion portion is in the retracted configuration. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15)
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16. An interspinous implant adapted to be inserted between spinous processes, the implant comprising:
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an interspinous spacer, including; a main portion having a recess; an expansion portion movable relative to the main portion between a retracted configuration relatively closer to the main portion and a deployed configuration relatively farther from the main portion, wherein a portion of the expansion portion is disposed at least partially in the recess in the retracted configuration;
the expansion portion having a bearing face facing away from the main portion;an insert-receiving cavity disposed between the expansion portion and the main portion; a longitudinal axis extending through a center of the spacer; an insert selectively matable with the spacer; wherein, with the insert disposed in the insert-receiving cavity, the insert urges the expansion portion away from the main portion to the deployed configuration; wherein the bearing face of the expansion portion is disposed closer to the longitudinal axis in the retracted configuration than in the deployed configuration.
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Specification