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Interspinous process implant and method of implantation

  • US 8,048,117 B2
  • Filed: 09/23/2005
  • Issued: 11/01/2011
  • Est. Priority Date: 05/22/2003
  • Status: Expired due to Fees
First Claim
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1. An interspinous implant adapted to be inserted between spinous processes, the implant comprising:

  • an interspinous spacer, including;

    a main portion having a recess;

    an expansion portion movable relative to the main portion between a retracted configuration relatively closer to the main portion and a deployed configuration relatively farther from the main portion, wherein the expansion portion is disposed at least partially in the recess in the retracted configuration;

    an insert-receiving cavity disposed between the expansion portion and the main portion;

    an insert selectively matable with the spacer;

    wherein, with the insert disposed in the insert-receiving cavity, the insert urges the expansion portion away from the main portion to the deployed configuration;

    wherein a larger amount of the expansion portion is disposed within the recess in the retracted configuration than in the deployed configuration.

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  • 8 Assignments
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