Method for manufacturing semiconductor device, semiconductor device and electronic appliance
First Claim
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1. A method for manufacturing a semiconductor device, comprising the steps of:
- forming an insulating layer over a substrate;
forming a non-single-crystal semiconductor layer over the insulating layer;
irradiating a single crystal semiconductor substrate with ions to form a damaged region in the single crystal semiconductor substrate;
attaching the non-single-crystal semiconductor layer and the single crystal semiconductor substrate to each other;
separating the single crystal semiconductor substrate at the damaged region to form a single crystal semiconductor layer over a first portion of the non-single-crystal semiconductor layer; and
forming a first gate electrode over the non-single-crystal semiconductor layer in a pixel region and a second gate electrode over the single crystal semiconductor layer in a driver circuit region after the separation of the single crystal semiconductor substrate,wherein the first gate electrode and the second gate electrode are formed in the same process.
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Abstract
A non-single-crystal semiconductor layer is formed over a substrate, and then a single crystal semiconductor layer is formed over part of the non-single-crystal semiconductor layer. Thus, a semiconductor element of a region which requires a large area (e.g. a pixel region in a display device) can be formed using the non-single-crystal semiconductor layer, and a semiconductor element of a region which requires high speed operation (e.g. a driver circuit region in a display device) can be formed using the single crystal semiconductor layer.
13 Citations
4 Claims
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1. A method for manufacturing a semiconductor device, comprising the steps of:
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forming an insulating layer over a substrate; forming a non-single-crystal semiconductor layer over the insulating layer; irradiating a single crystal semiconductor substrate with ions to form a damaged region in the single crystal semiconductor substrate; attaching the non-single-crystal semiconductor layer and the single crystal semiconductor substrate to each other; separating the single crystal semiconductor substrate at the damaged region to form a single crystal semiconductor layer over a first portion of the non-single-crystal semiconductor layer; and forming a first gate electrode over the non-single-crystal semiconductor layer in a pixel region and a second gate electrode over the single crystal semiconductor layer in a driver circuit region after the separation of the single crystal semiconductor substrate, wherein the first gate electrode and the second gate electrode are formed in the same process. - View Dependent Claims (2)
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3. A method for manufacturing a semiconductor device, comprising the steps of:
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forming a first insulating layer over a substrate; forming a non-single-crystal semiconductor layer over the first insulating layer; forming a second insulating layer over a surface of a single crystal semiconductor substrate; irradiating the single crystal semiconductor substrate with ions to form a damaged region in the single crystal semiconductor substrate; attaching the non-single-crystal semiconductor layer and the second insulating layer to each other; separating the single crystal semiconductor substrate at the damaged region to form a single crystal semiconductor layer over a first portion of the non-single-crystal semiconductor layer; and forming a first gate electrode over the non-single-crystal semiconductor layer in a pixel region and a second gate electrode over the single crystal semiconductor layer in a driver circuit region after the separation of the single crystal semiconductor substrate, wherein the first gate electrode and the second gate electrode are formed in the same process. - View Dependent Claims (4)
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Specification