Biosensor manufacturing method

• US 8,128,981 B2
• Filed: 04/10/2007
• Issued: 03/06/2012
• Est. Priority Date: 04/11/2006
• Status: Active Grant

• Current Assignee: Trividia Health, Inc. (Sinocare, Inc.)
• Original Assignee: Nipro Diagnostics, Inc.
• Inventors: Popovich, Natasha, Slomski, Dennis, Deng, David
• Primary Examiner(s): Yuan, Dah-Wei
• Assistant Examiner(s): Bowman, Andrew
• Application Number:
  US11/783,568
• Publication Number:
  US 20070286772A1
• Time in Patent Office: 1,792 Days
• Field of Search: 436/514, 438/393, 205/777.5, 427/2.11
• US Class Current: 427/2.11
• CPC Class Codes: G01N 27/3272 Test elements therefor, i.e. disposable laminated substrates with electrodes, reagent and channels optical biosensors G01N33/52

Abstract

A biosensor having a first conductive component is described, wherein the first conductive component includes at least one boundary formed by a first processing technique and at least one boundary formed by a second processing technique not the same as the first processing technique. The biosensor can also have a second conductive component including at least one boundary formed by the first processing technique and at least one boundary formed by a third processing technique not the same as the first processing technique. Further, the biosensor has a third conductive component including at least one boundary formed by the second processing technique and at least one boundary formed by the third processing technique not the same as the second processing technique.

Claims

1. A method of manufacturing test strips, comprising:

forming a reel containing a conductive layer and a base layer;

forming a first conductive component, wherein the first conductive component includes at least one first boundary formed by the movement of a first processing source along the at least one first boundary and at least one second boundary formed by the movement of a second processing source along the at least one second boundary, the second processing source is not the same as the first processing source, and the at least one first boundary is not the same as the at least one second boundary;

forming a second conductive component, wherein the second conductive component includes at least one third boundary formed by the movement of the first processing source along the at least one third boundary and at least one fourth boundary formed by a third processing source not the same as the first processing source, and the at least one third boundary is not the same as the at least one fourth boundary; and

forming a third conductive component, wherein the third conductive component includes at least one fifth boundary formed by the movement of the second processing source along the at least one fifth boundary and at least one sixth boundary formed by the third processing source not the same as the second processing source, and the at least one fifth boundary is not the same as the at least one sixth boundary.

2. The method of claim 1, wherein the first processing source is configured to perform at least one technique selected from the group consisting of laser ablation, stamping, cutting, and etching.

3. The method of claim 1, wherein the second processing source is configured to perform at least one technique selected from the group consisting of laser ablation, stamping, cutting, and etching.

4. The method of claim 1, wherein the third processing source is configured to perform at least one technique selected from the group consisting of laser ablation, stamping, cutting, and etching.

5. The method of claim 1, wherein the first processing source includes a first laser configured to emit a first ablative beam width and the second processing source includes a second laser configured to emit a second ablative beam width, wherein the first ablative beam width and the second ablative beam width are not the same.

6. The method of claim 5, wherein the first ablative beam width is at least approximately20 micro-meters.

7. The method of claim 5, wherein the second ablative beam width is at least approximately 100 micro-meters.

8. The method of claim 5, wherein substantially all of the conductive material between adjacent conductive components is removed and a distance between the adjacent conductive components is substantially equal to at least one of the first ablative beam width and the second ablative beam width.

9. The method of claim 1, wherein the first processing source includes a first type of laser and the second processing source includes a second type of laser, wherein the first type of laser and the second type of laser are not the same.

10. The method of claim 9, wherein the first or second type of laser is selected from the group consisting of a solid-state laser, a copper vapor laser, a diode laser, a carbon dioxide laser, and an excimer laser.

11. The method of claim 9, wherein the first or second type of laser operates in a region selected from at least one of an ultraviolet, a visible, and an infrared region.

12. The method of claim 1, wherein the first processing source includes a first laser operating at a first power and the second processing source includes a second laser operating at a second power, wherein the first power and the second power are not the same.

13. The method of claim 12, wherein the first or second laser power is in the range of about 10 to about 100 watts.

14. The method of claim 1, wherein the first processing source forms a single kerf and the second processing source forms a plurality of kerfs that does not include the single kerf.

15. The method of claim 1, further including the step of contacting the first conductive component with at least one chemical component.

16. The method of claim 15, wherein the at least one chemical component includes at least one compound selected from the group consisting of potassium ferricyanide, ruthenium hexamine, glucose oxidase and glucose dehydrogenase.

17. The method of claim 1, wherein at least one of the first conductive component, the second conductive component, and the third conductive component is formed from a semi-conductive material.

18. A method of manufacturing test strips, comprising:

forming a reel containing a conductive layer and a base layer;

forming a first kerf in the conductive layer, wherein the first kerf is formed using a first focused laser beam moved relative to the conductive layer along the first kerf;

forming a second kerf in the conductive layer, wherein the second kerf is formed using a second focused laser beam moved relative to the conductive layer along the second kerf, the first laser beam being different to the second laser beam;

separating one or more test strips from the reel using a singulation process.

19. The method of claim 18, wherein the singulation process includes at least one technique selected from the group consisting of laser ablation, stamping, cutting, and etching.

20. The method of claim 18, wherein the first laser beam has a first beam width and the second laser beam has a second beam width, wherein the first beam width and the second beam width are not the same.

21. The method of claim 20, wherein the first beam width is at least approximately 20 micro-meters.

22. The method of claim 20, wherein the second beam width is at least approximately 100 micro-meters.

23. The method of claim 18, wherein at least one laser beam removes substantially all conductive material between adjacent conductive components.

24. The method of claim 18, wherein the first laser beam is emitted from a first type of laser and the second laser beam is emitted from a second type of laser, wherein the first type of laser and the second type of laser are not the same.

25. The method of claim 24, wherein the first or second type of laser is selected from the group consisting of a solid-state laser, a copper vapor laser, a diode laser, a carbon dioxide laser, and an excimer laser.

26. The method of claim 24, wherein the first or second type of laser operates in a region selected from at least one of an ultraviolet, a visible, and an infrared region.

27. The method of claim 18, wherein the first laser beam is emitted from a first laser operating at a first power and the second laser beam is emitted from a second laser operating at a second power, wherein the first power and the second power are not the same.

28. The method of claim 27, wherein the first or second laser power is in the range of about 10 to about 100 watts.

29. The method of claim 18, further including the step of contacting at least part of the conductive layer with at least one chemical component.

30. The method of claim 29, wherein the at least one chemical component includes at least one compound selected from the group consisting of potassium ferricyanide, ruthenium hexamine, glucose oxidase and glucose dehydrogenase.

31. The method of claim 18, wherein at least one of the first conductive component, the second conductive component, and the third conductive component is formed from a semi-conductive material.

32. The method of claim 18, further including application of a spacer layer to the conductive layer or the base layer.

33. The method of claim 32, wherein the second kerf is formed after application of the spacer layer.

34. The method of claim 32, further including application of a cover to the spacer layer.

35. The method of claim 18, wherein the conductive layer is formed using a technique selected from the group consisting of direct writing, sputtering, screen printing, contract printing, and lamination.

36. The method of claim 18, further including the step of applying to the conductive layer at least one of a second conductive layer and a semi-conductive layer.

37. The method of claim 36, wherein the second kerf is formed after application of at least one of the second conductive layer and the semi-conductive layer.