Precursor delivery system
First Claim
1. A chemical reactant source vessel in combination with a gas delivery system for a vapor phase reactor for vapor processing of substrates, comprising:
- a vessel body defining an internal chamber adapted to contain a solid or liquid chemical reactant, wherein the vessel body includes an inlet and an outlet;
an inlet passage within the vessel body, the inlet passage extending from outside the vessel body to the vessel chamber;
an inlet valve attached directly to a substantially flat surface of the vessel body and configured to regulate flow through the inlet passage;
an outlet passage within the vessel body, the outlet passage extending from the vessel chamber to outside the vessel body;
an outlet valve attached directly to the substantially flat surface of the vessel body and configured to regulate flow through the outlet passage;
a vapor phase reaction chamber for processing substrates;
a plurality of gas panel valves collectively operative to convey a carrier gas through the vessel and into the reaction chamber, at least one of the gas panel valves being fluidly interposed between the outlet valve and the reaction chamber; and
a heater plate interposed between the gas panel valves and the flat surface of the vessel body, the heater plate configured to heat up the gas panel valves and the vessel;
wherein all of the gas panel valves are positioned within about 10.0 cm from the flat surface of the vessel body.
2 Assignments
0 Petitions
Accused Products
Abstract
A precursor source vessel comprises a vessel body, a passage within the vessel body, and a valve attached to a surface of the body. An internal chamber is adapted to contain a chemical reactant, and the passage extends from outside the body to the chamber. The valve regulates flow through the passage. The vessel has inlet and outlet valves, and optionally a vent valve for venting internal gas. An external gas panel can include at least one valve fluidly interposed between the outlet valve and a substrate reaction chamber. Gas panel valves can each be positioned along a plane that is generally parallel to, and no more than about 10.0 cm from, a flat surface of the vessel. Filters in a vessel lid or wall filter gas flow through the vessel'"'"'s valves. A quick-connection assembly allows fast and easy connection of the vessel to a gas panel.
464 Citations
19 Claims
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1. A chemical reactant source vessel in combination with a gas delivery system for a vapor phase reactor for vapor processing of substrates, comprising:
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a vessel body defining an internal chamber adapted to contain a solid or liquid chemical reactant, wherein the vessel body includes an inlet and an outlet; an inlet passage within the vessel body, the inlet passage extending from outside the vessel body to the vessel chamber; an inlet valve attached directly to a substantially flat surface of the vessel body and configured to regulate flow through the inlet passage; an outlet passage within the vessel body, the outlet passage extending from the vessel chamber to outside the vessel body; an outlet valve attached directly to the substantially flat surface of the vessel body and configured to regulate flow through the outlet passage; a vapor phase reaction chamber for processing substrates; a plurality of gas panel valves collectively operative to convey a carrier gas through the vessel and into the reaction chamber, at least one of the gas panel valves being fluidly interposed between the outlet valve and the reaction chamber; and a heater plate interposed between the gas panel valves and the flat surface of the vessel body, the heater plate configured to heat up the gas panel valves and the vessel; wherein all of the gas panel valves are positioned within about 10.0 cm from the flat surface of the vessel body. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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Specification