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Precursor delivery system

  • US 8,137,462 B2
  • Filed: 10/10/2007
  • Issued: 03/20/2012
  • Est. Priority Date: 10/10/2006
  • Status: Active Grant
First Claim
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1. A chemical reactant source vessel in combination with a gas delivery system for a vapor phase reactor for vapor processing of substrates, comprising:

  • a vessel body defining an internal chamber adapted to contain a solid or liquid chemical reactant, wherein the vessel body includes an inlet and an outlet;

    an inlet passage within the vessel body, the inlet passage extending from outside the vessel body to the vessel chamber;

    an inlet valve attached directly to a substantially flat surface of the vessel body and configured to regulate flow through the inlet passage;

    an outlet passage within the vessel body, the outlet passage extending from the vessel chamber to outside the vessel body;

    an outlet valve attached directly to the substantially flat surface of the vessel body and configured to regulate flow through the outlet passage;

    a vapor phase reaction chamber for processing substrates;

    a plurality of gas panel valves collectively operative to convey a carrier gas through the vessel and into the reaction chamber, at least one of the gas panel valves being fluidly interposed between the outlet valve and the reaction chamber; and

    a heater plate interposed between the gas panel valves and the flat surface of the vessel body, the heater plate configured to heat up the gas panel valves and the vessel;

    wherein all of the gas panel valves are positioned within about 10.0 cm from the flat surface of the vessel body.

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