Illumination system coherence remover with two sets of stepped mirrors

• US 8,164,740 B2
• Filed: 12/04/2008
• Issued: 04/24/2012
• Est. Priority Date: 12/02/2005
• Status: Expired due to Fees

• Current Assignee: ASML Holding NV, ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Holding NV, ASML Netherlands BV (ASML Holding NV)
• Inventors: Visser, Huibert, Klinkhamer, Jacob Fredrik Friso, Ryzhikov, Lev, Coston, Scott D., Joobeur, Adel, Vink, Rob, Shmarev, Yevgeniy
• Primary Examiner(s): Kim, Peter B
• Assistant Examiner(s): LIU, MICHAEL
• Application Number:
  US12/328,251
• Publication Number:
  US 20090091734A1
• Time in Patent Office: 1,237 Days
• Field of Search: 355/71, 355/35, 355/67, 355/53, 356/497
• US Class Current: 355/71
• CPC Class Codes: G02B 27/0905 Dividing and/or superposing multiple light beams
• CPC Class Codes: G03F 7/70075 Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
• CPC Class Codes: G03F 7/70583 Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Abstract

A coherence remover is provided. In an embodiment the coherence remover includes a first mirror and a second mirror coupled to the first mirror. The coherence remover is configured to receive an input beam. Each of the first and second mirrors is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam.

Claims

1. A coherence remover, comprising:

a first mirror;

a second mirror coupled to the first mirror;

a first polarizing beam splitter configured to receive an input beam and to pass the input beam having a first polarization such that the input beam is incident on the first and second mirrors, wherein the first and second mirrors comprise a first reflective surface normal to an axis of the input beam,

wherein each of the first and second mirrors is configured to reflect a respective portion of the input beam to produce one or more respective first intermediate beams, and

wherein the one or more respective first intermediate beams collectively form a first output beam that has a reduced coherence compared to the input beam;

a first quarter wave plate configured to alter a polarization state of the first output beam,

wherein the first polarizing beam splitter is configured to receive the altered first output beam having a second polarization and to reflect the altered first output beam;

a third mirror, separate from the first and second coupled mirrors;

a fourth mirror, coupled to the third mirror,

a second polarizing beam splitter configured to receive the altered first output beam and to reflect the altered first output beam having the second polarization such that the altered first output beam is incident on the third and fourth mirrors, wherein the third and fourth mirrors comprise a second reflective surface normal to an axis of the altered first output beam,

wherein each of the third and fourth mirrors is configured to reflect a respective portion of the altered first output beam to produce one or more respective second intermediate beams;

wherein each of the first and second mirrors substantially extends in a first axis, whereby the first output beam has a reduced coherence compared to the input beam in the first axis,

wherein each of the third and fourth mirrors substantially extends in a second axis that is perpendicular to the first axis, and

wherein the one or more respective second intermediate beams collectively form a second output beam that has a reduced coherence compared to the first output beam in the second axis; and

a second quarter wave plate configured to alter a polarization state of the second output beam,

wherein the second polarizing beam splitter is configured to receive the altered second output beam having a third polarization and to pass the altered second output beam.

2. The coherence remover of claim 1, wherein the first mirror comprises a substrate with opposing first and second surfaces, wherein the first surface is a first reflective surface, and wherein the second mirror is coupled to the second surface.

3. The coherence remover of claim 2, wherein a thickness between the first surface and the second surface is larger than a coherence length of the input beam.

4. The coherence remover of claim 2, wherein the substrate has an angled edge.

5. The coherence remover of claim 2, further comprising fifth through eighth mirrors, wherein each of the fifth through eighth mirrors is coupled to an adjacent mirror'"'"'s substrate.

6. The coherence remover of claim 1, wherein the altered second output beam is received by a homogenizer or a patterning device.

7. A lithographic apparatus, comprising:

a coherence remover, comprising,

a first mirror;

a second mirror coupled to the first mirror;

a first polarizing beam splitter configured to receive an input beam and to pass the input beam having a first polarization such that the input beam is incident on the first and second mirrors, wherein the first and second mirrors comprise a first reflective surface normal to an axis of the input beam,

wherein each of the first and second mirrors is configured to reflect a respective portion of the input beam to produce one or more respective first intermediate beams, and

wherein the one or more respective first intermediate beams collectively form a first output beam that has a reduced coherence compared to the input beam;

a first quarter wave plate configured to alter a polarization state of the first output beam,

wherein the first polarizing beam splitter is configured to receive the altered first output beam having a second polarization and to reflect the altered first output beam;

a third mirror, separate from the first and second coupled mirrors;

a fourth mirror, coupled to the third mirror,

a second polarizing beam splitter configured to receive the altered first output beam and to reflect the altered first output beam having the second polarization such that the altered first output beam is incident on the third and fourth mirrors, wherein the third and fourth mirrors comprise a second reflective surface normal to an axis of the altered first output beam,

wherein each of the third and fourth mirrors is configured to reflect a respective portion of the altered first output beam to produce one or more respective second intermediate beams;

wherein each of the first and second mirrors substantially extends in a first axis, whereby the first output beam has a reduced coherence compared to the input beam in the first axis,

wherein each of the third and fourth mirrors substantially extends in a second axis that is perpendicular to the first axis, and

wherein the one or more respective second intermediate beams collectively form a second output beam that has a reduced coherence compared to the first output beam in the second axis; and

a second quarter wave plate configured to alter a polarization state of the second output beam,

wherein the second polarizing beam splitter is configured to receive the altered second output beam having a third polarization and to pass the altered second output beam; and

a homogenizer configured to convert the output beam into a plurality of beams.

8. The lithographic apparatus of claim 7, further comprising:

a patterning device configured to modulate the plurality of beams, such that a pattern is formed on a substrate that receives the modulated plurality of beams.

9. The lithographic apparatus of claim 7, wherein the homogenizer comprises first and second homogenizer reflectors that are angled relative to one another.

10. The lithographic apparatus of claim 9, wherein the first and second homogenizer reflectors are configured to be mounted so that an angular orientation between the first and second homogenizer reflectors is adjustable.

11. The lithographic apparatus of claim 7, wherein the homogenizer comprises:

a first homogenizer device configured to homogenize the output beam in a first direction to produce a first homogenized output beam; and

a second homogenizer device configured to homogenize the first homogenized output beam in a second direction to produce a second homogenized beam, wherein the first direction is perpendicular to the second direction.

12. The lithographic apparatus of claim 11, wherein at least one of the first homogenizer device and the second homogenizer device comprises at least one of a plate or two parallel mirrors.

13. The lithographic apparatus of claim 11, further comprising:

a lens configured to condense the altered second output beam before it is received by the first homogenizer device.

14. The lithographic apparatus of claim 11, further comprising:

a first lens configured to receive the first homogenized beam and to produce a collimated output therefrom; and

a second lens configured to condense the collimated output,

wherein an orientation of the first lens is perpendicular to an orientation of the second lens.