Fabrication of low defectivity electrochromic devices
First Claim
1. An electrochromic window comprising:
- (a) an architectural glass substrate; and
(b) a electrochromic stack disposed on said substrate, the stack comprising a tungsten oxide electrochromic layer and a nickel tungsten oxide counter electrode layer;
wherein the electrochromic window has fewer than about 0.045 total visible defects per square centimeter in any region of electrochromic active area.
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Accused Products
Abstract
Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.
157 Citations
13 Claims
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1. An electrochromic window comprising:
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(a) an architectural glass substrate; and (b) a electrochromic stack disposed on said substrate, the stack comprising a tungsten oxide electrochromic layer and a nickel tungsten oxide counter electrode layer; wherein the electrochromic window has fewer than about 0.045 total visible defects per square centimeter in any region of electrochromic active area. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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Specification