Semiconductor chip manufacturing method
First Claim
1. A semiconductor chip manufacturing method wherein a semiconductor substrate having a plurality of functional devices formed in a matrix on its front face is divided into the functional devices to obtain semiconductor chips, the method comprising the steps of:
- irradiating a substrate with laser light, thereby forming a modified region embedded within the substrate along each line of a plurality of cutting lines arranged in a grid running betweeen the functional devices which are adjacent to one another; and
grinding or etching a rear face of the substrate after forming the modified regions, thereby causing the substrate to attain a predetermined thickness;
wherein after forming the modified regions and before grinding or etching the rear face of the substrate, fractures generated from each modified region reach the front face of the substrate.
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Abstract
A substrate dividing method which can thin and divide a substrate while preventing chipping and cracking from occurring. This substrate dividing method comprises the steps of irradiating a semiconductor substrate 1 having a front face 3 formed with functional devices 19 with laser light while positioning a light-converging point within the substrate, so as to form a modified region including a molten processed region due to multiphoton absorption within the semiconductor substrate 1, and causing the modified region including the molten processed region to form a starting point region for cutting; and grinding a rear face 21 of the semiconductor substrate 1 after the step of forming the starting point region for cutting such that the semiconductor substrate 1 attains a predetermined thickness.
216 Citations
6 Claims
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1. A semiconductor chip manufacturing method wherein a semiconductor substrate having a plurality of functional devices formed in a matrix on its front face is divided into the functional devices to obtain semiconductor chips, the method comprising the steps of:
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irradiating a substrate with laser light, thereby forming a modified region embedded within the substrate along each line of a plurality of cutting lines arranged in a grid running betweeen the functional devices which are adjacent to one another; and grinding or etching a rear face of the substrate after forming the modified regions, thereby causing the substrate to attain a predetermined thickness; wherein after forming the modified regions and before grinding or etching the rear face of the substrate, fractures generated from each modified region reach the front face of the substrate. - View Dependent Claims (2, 3, 4, 5, 6)
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Specification