Color filter and photomask to be employed for the manufacture of color filter
First Claim
1. A color filter comprising:
- a first photo-spacer; and
a second photo-spacer having a smaller thickness than that of the first photo-spacer;
wherein the first photo-spacer has a cross-sectional configuration whose longitudinal width is the same as the lateral width, and the second photo-spacer has a cross-sectional configuration whose longitudinal width is made greater than the lateral width.
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Abstract
A color filter including a first photo-spacer, and a second photo-spacer having a smaller film thickness than that of the first photo-spacer, wherein the second photo-spacer has a cross-sectional configuration whose longitudinal width is made greater than the lateral width. These photo-spacers are formed by making use of a photomask which includes a first aperture pattern for forming the first photo-spacer, a second aperture pattern for forming the second photo-spacer which has a smaller film thickness than that of the first photo-spacer, wherein an aperture of the second aperture pattern has a lateral width in the range 2.0-10.0 μm and the ratio of lateral width to longitudinal width is confined to 11.25 or more.
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Citations
14 Claims
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1. A color filter comprising:
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a first photo-spacer; and a second photo-spacer having a smaller thickness than that of the first photo-spacer; wherein the first photo-spacer has a cross-sectional configuration whose longitudinal width is the same as the lateral width, and the second photo-spacer has a cross-sectional configuration whose longitudinal width is made greater than the lateral width. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A color filter comprising:
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a first photo-spacer; and a second photo-spacer having a smaller film thickness than that of the first photo-spacer; wherein the first photo-spacer has a cross-sectional configuration whose longitudinal width is the same as the lateral width, and the second photo-spacer has a cross-sectional configuration whose longitudinal width is made greater than the lateral width, and the first photo-spacer and the second photo-spacer are formed by subjecting a photosensitive composition to a single exposure and to a single developing operation by making use of a photomask comprising; a first aperture pattern for forming a first photo-spacer; and a second aperture pattern for forming a second photo-spacer which has a smaller film thickness than that of the first photo-spacer, wherein an aperture of the second aperture pattern has a lateral width ranging from 2.0 to 10.0 μ
m, and a ratio of lateral width to longitudinal width is 1;
1.25 or more.
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Specification