Controlled-transparency electrochromic device

• US 8,405,896 B2
• Filed: 04/15/2010
• Issued: 03/26/2013
• Est. Priority Date: 04/16/2009
• Status: Active Grant

• Current Assignee: Saint-Gobain Glass France (Compagnie De Saint-Gobain)
• Original Assignee: Saint-Gobain Glass France (Compagnie De Saint-Gobain)
• Inventors: Lamine, Driss, Valentin, Emmanuel, Dubrenat, Samuel
• Primary Examiner(s): Martinez, Joseph P
• Application Number:
  US12/922,341
• Publication Number:
  US 20120019889A1
• Time in Patent Office: 1,076 Days
• Field of Search: 359265-275
• US Class Current: 359/265
• CPC Class Codes: G02F 1/1533 structural features not otherwise provided for
• CPC Class Codes: G02F 1/155 Electrodes
• CPC Class Codes: G02F 2001/1557 Side by side arrangements of working and counter electrodes

Abstract

The present invention relates to an electrochromic device having at least one active area (CDEF), having, on a carrier substrate (3), a multilayer stack comprising a layer forming a lower electrode (4), various functional layers (7) at least one of which is an electrochromic layer, at least one (6, 7a) of these layers being electrically insulating, and an upper electrode (9), in which device:

• • at least one partition (5) separating the surface of the lower electrode (4) into two isolated regions, namely a free region (4a) and an active region (4b) containing the active area (CDEF); and
  • at least one partition (12) separating the surface of the upper electrode (9) into two regions electrically isolated from each other, namely a free region (9a) and an active region (9b) containing the active area (CDEF).

Claims

1. An electrochromic device having controlled transmission or reflection of at least one electrically controllable active area (CDEF), comprising, on a carrier substrate, a multilayer stack comprising at least, in succession;

a layer forming a lower electrically conductive electrode;

various functional layers, at least one of which is an electrochromic layer, and at least one of these layers being electrically insulating; and

an upper electrically conductive electrode, in which device;

at least one total partition extends from the electrically insulating layer without passing through it, and passes through the layer(s) separating the insulating layer from the substrate, the total partition dividing a surface of the lower electrode into two regions electrically isolated from each other, namely a free region, in line with which the upper electrode is soldered to a first current-supply connector, and an active region containing the active area (CDEF); and

at least one selective partition passes through the upper electrode and the various layers separating the upper electrode from the lower electrode, the selective partition dividing a surface of the upper electrode into two regions electrically isolated from each other, namely a free region that receives a second current-supply connector which is soldered to the lower electrode, and an active region containing the active area (CDEF), wherein the free region of the lower electrode is soldered to the current-supply connector of the upper electrode.

2. The device as claimed in claim 1, wherein the carrier substrate comprises a glazing and, optionally, comprises glass or plastic.

3. The device as claimed in claim 1, wherein at least one of the solder joints between a current-supply connector and an electrode is ultrasonically soldered.

4. The device as claimed in claim 1, wherein the upper electrode is covered with at least one moisture protection layer, and the at least one moisture protection layer is penetrated by said selective partition.

5. The device as claimed in claim 1, wherein said electrically insulating layer is a tantalum oxide (Ta₂O₅) layer deposited on the lower electrode.

6. The device as claimed in claim 1, wherein at least one of the electrodes comprises at least one indium tin oxide (ITO) layer.

7. The device as claimed in claim 1, wherein the upper electrode is in contact with an array of fine electrically conducting wires, connected to at least the second connector.

8. The device as claimed in claim 7, wherein the array of wires is supported by a support.

9. The device as claimed in claim 1, wherein the free regions defined by the total partitions and selective partitions are located on the periphery of said device.

10. The device as claimed in claim 9, wherein the substrate is rectangular shaped and the at least one total partition and at least one selective are respectively produced so as to be parallel with opposed sides of the substrate.

11. The device as claimed in claim 1, wherein the at least one total is in four corners of the substrate so as to constitute substantially square free regions, and in that the at least one selective partition is substantially in the middle of the periphery of the edges of said device so as to constitute substantially rectangular free regions.

12. An electrochromic glazing, comprising an electrochromic device as claimed in claim 1.

13. An architectural, automotive, mirror, display, signage, or camera shutter glazing comprising the glazing as claimed in claim 12.

14. A process for fabricating an electrochromic device comprising controlled transmission or reflection of at least one electrically controllable active area (CDEF), having on a carrier substrate, a multilayer stack comprising at least, in succession:

an electrically conductive layer forming a lower electrode;

various functional layers at least one of which is an electrochromic layer, at least one of these layers being electrically insulating; and

an electrically conductive layer forming an upper electrode,

the method comprising;

(A) depositing, onto at least part of the surface of the substrate, at least one electrically conductive layer forming the lower electrode, and the layers preceding said electrically insulating layer;

(B) producing, starting from the electrically insulating layer, without passing through it, at least one total partition of the layer(s) separating the insulating layer from the substrate, each total partition dividing a surface of the lower electrode into two regions electrically isolated from each other, namely a free region, and an active region containing the active area (CDEF);

(C) depositing, onto the free and the active regions, the electrically insulating layer, the various other functional layers, and the electrically conductive layer forming the upper electrode;

(D) producing at least one selective partition through the upper electrode and through the various layers separating the upper electrode from the lower electrode, each selective partition dividing the surface of the upper electrode into two regions electrically isolated from each other, namely a free region and an active region containing the active area (CDEF);

(E) soldering a first current-supply connector to the active region of the upper electrode; and

(F) soldering a second current-supply connector to the free region of the upper electrode and to the active region of the lower electrode located in line with the latter

wherein the first current-supply connector is soldered to the free region of the lower electrode.

15. The process as claimed in claim 14, wherein at least one of the solder joints is ultrasonically soldered.

16. The process as claimed in claim 14, wherein at least one of the total and selective partitions is produced by a laser beam.

17. The process as claimed in claim 14, further comprising producing

several electrochromic devices having controlled transmission or reflection of at least one electrically controllable active area (CDEF), comprising, on a carrier substrate, a multilayer stack comprising at least, in succession;

a layer forming a lower electrically conductive electrode;

various functional layers, at least one of which is an electrochromic layer, and at least one of these layers being electrically insulating; and

an upper electrically conductive electrode, in which device;

at least one total partition extends from the electrically insulating layer without passing through it, and passes through the layer(s) separating the insulating layer from the substrate, the total partition dividing a surface of the lower electrode into two regions electrically isolated from each other, namely a free region, in line with which the upper electrode is soldered to a first current-supply connector, and an active region containing the active area (CDEF); and

at least one selective partition passes through the upper electrode and the various layers separating the upper electrode from the lower electrode, the selective partition dividing a surface of the upper electrode into two regions electrically isolated from each other, namely a free region that receives a second current-supply connector which is soldered to the lower electrode, and an active region containing the active area (CDEF),

on the same carrier substrate, and once said devices are completed, cutting the carrier substrate and all the layers deposited thereon so as to constitute specific devices.