Negative resist composition and patterning process

  • US 8,470,509 B2
  • Filed: 10/12/2010
  • Issued: 06/25/2013
  • Est. Priority Date: 12/01/2009
  • Status: Active Grant
First Claim
Patent Images

1. A negative resist composition comprising at least:

  • (A) a base resin that is alkaline-soluble and is made alkaline-insoluble by action of an acid, and/or a combination of a base resin that is alkaline-soluble and is made alkaline-insoluble by reaction with a crosslinker by action of an acid, with a crosslinker;

    (B) an acid generator; and

    (C) a compound containing a nitrogen atom as a basic component,wherein the base resin contains at least repeating units represented by the following general formula (1), general formula (2), and general formula (4) and has a weight average molecular weight of 1,000 to 10,000,

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