Semiconductor device and manufacturing method for the same

• US 8,470,650 B2
• Filed: 10/18/2010
• Issued: 06/25/2013
• Est. Priority Date: 10/21/2009
• Status: Active Grant

• Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Original Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Inventors: Akimoto, Kengo, Sakata, Junichiro, Yamazaki, Shunpei
• Primary Examiner(s): Lee, Hsien Ming
• Assistant Examiner(s): Fan, Michele
• Application Number:
  US12/906,553
• Publication Number:
  US 20110092017A1
• Time in Patent Office: 981 Days
• Field of Search: 438/149, 438/151, 438/164, 438/597, 438/652, 438/685, 438/157, 257/E21.411, 257/E21.535, 257/E29.273, 257/E29.275
• US Class Current: 438/151
• CPC Class Codes: H01L 27/1225 with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO
• CPC Class Codes: H01L 29/78618 characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure silicide contacts, electrodes in general H01L29/458
• CPC Class Codes: H01L 29/7869 having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate

Abstract

An object is to provide a method for manufacturing a highly reliable semiconductor device including thin film transistors which have stable electric characteristics and are formed using an oxide semiconductor. A method for manufacturing a semiconductor device includes the steps of: forming an oxide semiconductor film over a gate electrode with a gate insulating film interposed between the oxide semiconductor film and the gate electrode, over an insulating surface; forming a first conductive film including at least one of titanium, molybdenum, and tungsten, over the oxide semiconductor film; forming a second conductive film including a metal having lower electronegativity than hydrogen, over the first conductive film; forming a source electrode and a drain electrode by etching of the first conductive film and the second conductive film; and forming an insulating film in contact with the oxide semiconductor film, over the oxide semiconductor film, the source electrode, and the drain electrode.

Claims

1. A method for manufacturing a semiconductor device, comprising the steps of:

forming an oxide semiconductor film over a first gate electrode with a gate insulating film interposed therebetween;

forming a first conductive film including titanium, molybdenum, or tungsten, over the oxide semiconductor film;

forming a second conductive film over the first conductive film;

forming a source electrode and a drain electrode by etching of the first conductive film and the second conductive film;

forming an insulating film over the oxide semiconductor film, the source electrode, and the drain electrode; and

forming a second gate electrode over the insulating film,

wherein the first gate electrode is over an insulating surface,

wherein the insulating film is in contact with the oxide semiconductor film, and

wherein the second gate electrode covers an entirety of the oxide semiconductor film.

2. The method for manufacturing a semiconductor device, according to claim 1, wherein the second conductive film includes a metal including aluminum and magnesium.

3. The method for manufacturing a semiconductor device, according to claim 1, wherein the insulating film includes a structure in which a first insulating film containing silicon oxide or silicon oxynitride and a second insulating film containing silicon nitride, silicon nitride oxide, aluminum nitride, or aluminum nitride oxide are sequentially stacked.

4. The method for manufacturing a semiconductor device, according to claim 1, wherein the gate insulating film includes a structure in which a first gate insulating film containing silicon nitride, silicon nitride oxide, aluminum nitride, or aluminum nitride oxide and a second gate insulating film containing silicon oxide or silicon oxynitride are sequentially stacked.

5. A method for manufacturing a semiconductor device, comprising the steps of:

forming an oxide semiconductor film over a first gate electrode with a gate insulating film interposed therebetween;

forming a first conductive film including titanium, molybdenum, or tungsten, over the oxide semiconductor film;

forming a second conductive film over the first conductive film;

performing heat treatment in an inert atmosphere with the second conductive film exposed;

forming a source electrode and a drain electrode by etching of the first conductive film and the second conductive film after performing the heat treatment;

forming an insulating film over the oxide semiconductor film, the source electrode, and the drain electrode; and

forming a second gate electrode over the insulating film,

wherein the first gate electrode is over an insulating surface,

wherein the insulating film is in contact with the oxide semiconductor film, and

wherein the second gate electrode covers an entirety of the oxide semiconductor film.

6. The method for manufacturing a semiconductor device, according to claim 5, wherein the heat treatment is performed at higher than or equal to 200°

C. and lower than or equal to 450°

C.

7. The method for manufacturing a semiconductor device, according to claim 5, wherein the second conductive film includes a metal including aluminum and magnesium.

8. The method for manufacturing a semiconductor device, according to claim 5, wherein the insulating film includes a structure in which a first insulating film containing silicon oxide or silicon oxynitride and a second insulating film containing silicon nitride, silicon nitride oxide, aluminum nitride, or aluminum nitride oxide are sequentially stacked.

9. The method for manufacturing a semiconductor device, according to claim 5, wherein the gate insulating film includes a structure in which a first gate insulating film containing silicon nitride, silicon nitride oxide, aluminum nitride, or aluminum nitride oxide and a second gate insulating film containing silicon oxide or silicon oxynitride are sequentially stacked.

10. A method for manufacturing a semiconductor device, comprising the steps of:

forming an oxide semiconductor film over a gate electrode with a gate insulating film interposed therebetween;

forming a first conductive film including titanium, molybdenum, or tungsten, over the oxide semiconductor film;

forming a second conductive film including a metal having lower electronegativity than hydrogen, over the first conductive film;

etching the second conductive film;

forming a third conductive film including a metal having lower electronegativity than hydrogen over the first conductive film after the second conductive film is etched;

forming a source electrode and a drain electrode by etching of the first conductive film and the third conductive film; and

forming an insulating film over the oxide semiconductor film, the source electrode, and the drain electrode,

wherein the gate electrode is over an insulating surface, and

wherein the insulating film is in contact with the oxide semiconductor film.

11. The method for manufacturing a semiconductor device, according to claim 10, wherein the metal having lower electronegativity than hydrogen is aluminum or magnesium.

12. The method for manufacturing a semiconductor device, according to claim 10, wherein the insulating film includes a structure in which a first insulating film containing silicon oxide or silicon oxynitride and a second insulating film containing silicon nitride, silicon nitride oxide, aluminum nitride, or aluminum nitride oxide are sequentially stacked.

13. The method for manufacturing a semiconductor device, according to claim 10, wherein the gate insulating film includes a structure in which a first gate insulating film containing silicon nitride, silicon nitride oxide, aluminum nitride, or aluminum nitride oxide and a second gate insulating film containing silicon oxide or silicon oxynitride are sequentially stacked.

14. A method for manufacturing a semiconductor device, comprising the steps of:

forming an oxide semiconductor film over a gate electrode with a gate insulating film interposed therebetween;

forming a first conductive film including titanium, molybdenum, or tungsten, over the oxide semiconductor film;

forming a second conductive film including a metal having lower electronegativity than hydrogen, over the first conductive film;

performing heat treatment in an inert atmosphere with the second conductive film exposed;

etching the second conductive film;

forming a third conductive film including a metal having lower electronegativity than hydrogen over the first conductive film after the second conductive film is etched;

forming a source electrode and a drain electrode by etching of the first conductive film and the third conductive film; and

forming an insulating film over the oxide semiconductor film, the source electrode, and the drain electrode,

wherein the gate electrode is over an insulating surface, and

wherein the insulating film is in contact with the oxide semiconductor film.

15. The method for manufacturing a semiconductor device, according to claim 14, wherein the heat treatment is performed at higher than or equal to 200°

C. and lower than or equal to 450°

C.

16. The method for manufacturing a semiconductor device, according to claim 14, wherein the metal having lower electronegativity than hydrogen is aluminum or magnesium.

17. The method for manufacturing a semiconductor device, according to claim 14, wherein the insulating film includes a structure in which a first insulating film containing silicon oxide or silicon oxynitride and a second insulating film containing silicon nitride, silicon nitride oxide, aluminum nitride, or aluminum nitride oxide are sequentially stacked.

18. The method for manufacturing a semiconductor device, according to claim 14, wherein the gate insulating film includes a structure in which a first gate insulating film containing silicon nitride, silicon nitride oxide, aluminum nitride, or aluminum nitride oxide and a second gate insulating film containing silicon oxide or silicon oxynitride are sequentially stacked.

19. A method for manufacturing a semiconductor device, comprising the steps of:

forming an oxide semiconductor film over a gate electrode with a gate insulating film interposed therebetween;

forming a first conductive film including titanium, molybdenum, or tungsten, over the oxide semiconductor film;

forming a second conductive film including a metal having lower electronegativity than hydrogen, over the first conductive film;

etching the second conductive film;

forming a third conductive film including a metal having lower electronegativity than hydrogen over the first conductive film after the second conductive film is etched;

forming a fourth conductive film including titanium, molybdenum, or tungsten, over the third conductive film;

forming a source electrode and a drain electrode by etching of the first conductive film, the third conductive film, and the fourth conductive film; and

forming an insulating film over the oxide semiconductor film, the source electrode, and the drain electrode,

wherein the gate electrode is over an insulating surface, and

wherein the insulating film is in contact with the oxide semiconductor film.

20. The method for manufacturing a semiconductor device, according to claim 19, wherein the metal having lower electronegativity than hydrogen is aluminum or magnesium.

21. The method for manufacturing a semiconductor device, according to claim 19, wherein the insulating film includes a structure in which a first insulating film containing silicon oxide or silicon oxynitride and a second insulating film containing silicon nitride, silicon nitride oxide, aluminum nitride, or aluminum nitride oxide are sequentially stacked.

22. The method for manufacturing a semiconductor device, according to claim 19, wherein the gate insulating film includes a structure in which a first gate insulating film containing silicon nitride, silicon nitride oxide, aluminum nitride, or aluminum nitride oxide and a second gate insulating film containing silicon oxide or silicon oxynitride are sequentially stacked.

23. A method for manufacturing a semiconductor device, comprising the steps of:

forming an oxide semiconductor film over a gate electrode with a gate insulating film interposed therebetween;

forming a first conductive film including titanium, molybdenum, or tungsten, over the oxide semiconductor film;

forming a second conductive film including a metal having lower electronegativity than hydrogen, over the first conductive film;

performing heat treatment in an inert atmosphere with the second conductive film exposed;

etching the second conductive film;

forming a third conductive film including a metal having lower electronegativity than hydrogen over the first conductive film after the second conductive film is etched;

forming a fourth conductive film including titanium, molybdenum, or tungsten, over the third conductive film;

forming a source electrode and a drain electrode by etching of the first conductive film, the third conductive film, and the fourth conductive film; and

forming an insulating film over the oxide semiconductor film, the source electrode, and the drain electrode,

wherein the gate electrode is over an insulating surface, and

wherein the insulating film is in contact with the oxide semiconductor film.

24. The method for manufacturing a semiconductor device, according to claim 23, wherein the heat treatment is performed at higher than or equal to 200°

C. and lower than or equal to 450°

C.

25. The method for manufacturing a semiconductor device, according to claim 23, wherein the metal having lower electronegativity than hydrogen is aluminum or magnesium.

26. The method for manufacturing a semiconductor device, according to claim 23, wherein the insulating film includes a structure in which a first insulating film containing silicon oxide or silicon oxynitride and a second insulating film containing silicon nitride, silicon nitride oxide, aluminum nitride, or aluminum nitride oxide are sequentially stacked.

27. The method for manufacturing a semiconductor device, according to claim 23, wherein the gate insulating film includes a structure in which a first gate insulating film containing silicon nitride, silicon nitride oxide, aluminum nitride, or aluminum nitride oxide and a second gate insulating film containing silicon oxide or silicon oxynitride are sequentially stacked.