Laser-driven light source

• US 8,525,138 B2
• Filed: 02/09/2011
• Issued: 09/03/2013
• Est. Priority Date: 03/31/2006
• Status: Active Grant

• Current Assignee: Hamamatsu Photonics KK
• Original Assignee: Energetiq Technology Incorporated (Hamamatsu Photonics KK)
• Inventors: Smith, Donald K., Besen, Matthew, Zhu, Huiling, Stolyarov, Daniil, Ye, Hongke, Hill, Gordon, Collins, Ron
• Primary Examiner(s): Kim, Robert
• Assistant Examiner(s): MCCORMACK, JASON L
• Application Number:
  US13/024,027
• Publication Number:
  US 20110181191A1
• Time in Patent Office: 937 Days
• Field of Search: 250/503.1, 250/504.R
• US Class Current: 250/503.1
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: G03F 7/70033 by plasma extreme ultraviolet [EUV] sources
• CPC Class Codes: G21K 5/00 Irradiation devices discharge tubes for irradiating H01J37/00
• CPC Class Codes: G21K 5/04 with beam-forming means
• CPC Class Codes: H01J 61/16 having helium, argon, neon, krypton, or xenon as the principle constituent
• CPC Class Codes: H01J 65/04 Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
• CPC Class Codes: H05B 41/382 during the transitional start-up phase
• CPC Class Codes: H05G 2/001 X-ray radiation generated from plasma plasma for generation of electrons to be accelerated towards an anode H01J35/00
• CPC Class Codes: H05G 2/003 being produced from a liquid or gas
• CPC Class Codes: H05G 2/005 containing a metal as principal radiation generating component
• CPC Class Codes: H05G 2/008 involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
• CPC Class Codes: Y02B 20/00 Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps
• CPC Class Codes: Y10T 29/49002 Electrical device making

Abstract

An apparatus for producing light includes a chamber and an ignition source that ionizes a gas within the chamber. The apparatus also includes at least one laser that provides energy to the ionized gas within the chamber to produce a high brightness light. The laser can provide a substantially continuous amount of energy to the ionized gas to generate a substantially continuous high brightness light.

Claims

1. A light source comprising:

a pressurized chamber having a gas disposed therein;

an ignition source comprising electrodes for exciting the gas, the excited gas having at least one strong absorption line at an infrared wavelength;

at least one laser configured to provide energy to the excited gas at a wavelength within 10 nm of a strong absorption line of the excited gas within the chamber to sustain a plasma and produce at least substantially continuous, plasma-generated light.

2. The light source of claim 1 wherein the gas comprises a noble gas.

3. The light source of claim 1 wherein the gas comprises xenon.

4. The light source of claim 1 wherein the excited gas comprises atoms at a lowest excited state.

5. The light source of claim 1 wherein the gas is absorptive near the wavelength of the at least one laser.

6. The light source of claim 1 wherein the strong absorption line of the excited gas is about 980 nm.

7. The light source of claim 1 wherein the strong absorption line of the excited gas is about 882 nm.

8. The light source of claim 1 wherein the excited gas is in a metastable state.

9. The light source of claim 1 further comprising a means for tuning the wavelength of the laser to within 10 nm away from the absorption line of the excited gas, to increase a radiance of the plasma-generated light.

10. The light source of claim 1 wherein a power of the laser is about 10 or 30 or 50 or 60 or 100 or 200 watts.

11. A method for producing light comprising:

providing a light source comprising a pressurized chamber having a gas disposed therein;

an ignition source comprising electrodes for exciting the gas, the excited gas having at least one strong absorption line at an infrared wavelength; and

at least one laser configured to provide energy to the excited gas at a wavelength within 10 nm of a strong absorption line of the excited gas within the chamber to sustain a plasma and produce an at least substantially continuous, plasma-generated light;

exciting with the ignition source the gas within the chamber;

tuning the laser to a first wavelength to provide energy to the excited gas in the chamber to produce the light, the excited gas absorbing energy near the first wavelength; and

tuning the laser to a second wavelength to provide energy to the excited gas in the chamber to maintain the light, the excited gas absorbing energy near the second wavelength.

12. The method of claim 11 wherein tuning the laser to the first and second wavelengths comprises adjusting the operating temperature of the laser.

13. The method of claim 12 wherein the laser is a diode laser and the laser is tuned approximately 0.4 nm per degree Celsius of temperature adjustment.

14. The method of claim 12 wherein the operating temperature of the laser can be adjusted by varying a current of a thermoelectric cooling device.

15. The method of claim 11 wherein the gas within the chamber has atoms with electrons in at least one excited atomic state.

16. The method of claim 11 wherein the gas within the chamber is xenon.

17. The method of claim 16 wherein the first wavelength is approximately 980 nm.

18. The method of claim 16 wherein the second wavelength is approximately 975 nm.

19. The method of claim 11 wherein the second wavelength is approximately 1 nm to approximately 10 nm displaced from the first wavelength.

20. A light source comprising:

a pressurized chamber having a gas disposed therein;

an ignition source comprising electrodes for exciting the gas, the excited gas having at least one strong absorption line at an infrared wavelength; and

at least one laser configured to provide energy to the excited gas at a wavelength within 10 nm of a strong absorption line of the excited gas within the chamber to sustain a plasma and produce an at least substantially continuous, plasma-generated light, wherein the chamber has one or more walls and the at least one laser provides energy to the gas within the chamber to produce a plasma that generates a light emitted through the walls of the chamber, the light source further comprising;

a dichroic mirror directed toward the plasma, the dichroic mirror selectively reflecting at least one wavelength of light such that the light generated by the plasma is not substantially reflected toward the at least one laser.

21. A light source comprising:

a pressurized chamber having a gas disposed therein;

an ignition source comprising electrodes for exciting the gas, the gas having at least one strong absorption line at an infrared wavelength; and

at least one laser configured to provide energy to the excited gas at a wavelength within 10 nm of a strong absorption line of the excited gas within the chamber to sustain a plasma and produce an at least substantially continuous, plasma-generated light;

the at least one laser provides energy to the excited gas within the chamber to produce the light having a first spectrum, the light source further comprising;

an optical element disposed within the path of the light to modify the first spectrum of the light to a second spectrum.

22. The light source of claim 21 wherein the optical element is a prism.

23. The light source of claim 21 wherein the optical element is a weak lens.

24. The light source of claim 21 wherein the optical element is a strong lens.

25. The light source of claim 21 wherein the optical element is a dichroic filter.

26. The light source of claim 21 wherein the second spectrum has a greater intensity of light in the ultraviolet range than the first spectrum.

27. The light source of claim 21 wherein the first spectrum has a greater intensity of light in the visible range than the second spectrum.