Sintered complex oxide, method for producing sintered complex oxide, sputtering target and method for producing thin film

  • US 8,569,192 B2
  • Filed: 07/14/2009
  • Issued: 10/29/2013
  • Est. Priority Date: 07/15/2008
  • Status: Active Grant
First Claim
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1. A sintered complex oxide comprising:

  • metal oxide particles (a) having a hexagonal lamellar structure and containing zinc oxide and indium, andmetal oxide particles (b) having a spinel structure and containing a metal element M (where M is aluminum and/or gallium),wherein the mean value of the long diameter of the metal oxide particles (a) is no greater than 10 μ

    M, and at least 20% of the entire metal oxide particles (a) have an aspect ratio (long diameter/short diameter) of 2 or greater, based on the number of particles.

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