Hot tile sputtering system

• US 8,673,122 B2
• Filed: 04/06/2010
• Issued: 03/18/2014
• Est. Priority Date: 04/07/2009
• Status: Active Grant

• Current Assignee: Magna Mirrors of America Incorporated (Magna International Incorporated)
• Original Assignee: Magna Mirrors of America Incorporated (Magna International Incorporated)
• Inventors: McCabe, Ian A., Harlow, Jeffrey D.
• Primary Examiner(s): Hendricks, Keith
• Assistant Examiner(s): Wanga, Timon
• Application Number:
  US12/754,951
• Publication Number:
  US 20100252418A1
• Time in Patent Office: 1,442 Days
• Field of Search: 204/192.26
• US Class Current: 204/298.12
• CPC Class Codes: C23C 14/3407 Cathode assembly for sputtering apparatus, e.g. Target
• CPC Class Codes: C23C 14/3421 using heated targets
• CPC Class Codes: H01J 37/3408 Planar magnetron sputtering
• CPC Class Codes: H01J 37/3423 Shape
• CPC Class Codes: H01J 37/3435 Target holders (includes backing plates and endblocks)
• CPC Class Codes: H01J 37/3497 Temperature of target

Abstract

A system and method for sputtering a coating onto a glass substrate in a vacuum deposition chamber includes providing a backing plate with a separating element disposed at the backing plate. At least one target element or tile is disposed on a surface of the separating element, wherein an expansion gap is provided to allow for expansion of the target relative to the separating element during the sputtering process. The method includes sputtering material from the target and heating the target to a substantially elevated temperature during the sputtering process. The separating element may be a sheet having a low-coefficient of friction surface, and the target may be disposed on the low-coefficient of friction surface of the separating element. The separating element may thermally insulate the target from the backing plate, whereby the target may be heated to a substantially greater temperature than the backing plate during the sputtering process.

Claims

1. A sputtering assembly for sputtering a coating onto a glass substrate in a vacuum deposition chamber, said sputtering assembly comprising:

a backing plate;

a separating element disposed at said backing plate;

at least one target element disposed at a surface of said separating element, wherein said at least one target element contacts said separating element and wherein said at least one target element is not bonded to said separating element;

wherein, during a sputtering process that sputters a coating onto a glass substrate, said at least one target element is disposed at an upper surface of said separating element and is vertically held in place by gravity;

wherein at least one expansion gap is provided at or adjacent to said at least one target element to allow for thermal expansion of said at least one target element relative to said separating element during the sputtering process; and

wherein said at least one target element is capable of movement relative to said separating element and along said upper surface of said separating element during the sputtering process.

2. The sputtering assembly of claim 1, wherein said separating element comprises an electrically conductive material.

3. The sputtering assembly of claim 1, wherein said separating element comprises a sheet having a low-coefficient of friction surface, and wherein said at least one target element is disposed on said low-coefficient of friction surface of said separating element.

4. The sputtering assembly of claim 1, wherein said separating element comprises a graphite sheet.

5. The sputtering assembly of claim 1, wherein said separating element thermally insulates said at least one target element from said backing plate, and allows said at least one target element to achieve a substantially elevated temperature during the sputtering process.

6. The sputtering assembly of claim 5, wherein said at least one target element, at least in part due to the sputtering process, achieves a substantially elevated temperature in the range of about 400 to 600 degrees C. during the sputtering process.

7. The sputtering assembly of claim 1, wherein said at least one target element comprises a plurality of target elements arranged on said separating sheet with expansion gaps established between adjacent target elements to allow for expansion of said target elements during the sputtering process.

8. The sputtering assembly of claim 1, wherein said at least one target element is retained at said backing plate via at least one clamping element.

9. The sputtering assembly of claim 8, wherein said clamping element comprises an expansion element so as to substantially retain said target element at said backing plate while allowing for expansion of said target element during the sputtering process.

10. The sputtering assembly of claim 1, wherein said sputtering assembly is for sputtering a transparent conductive coating onto a glass substrate of a mirror reflective element for a vehicular interior or exterior rearview mirror assembly.

11. The sputtering assembly of claim 1, wherein said at least one target element is retained at said backing plate via at least one retaining element, and wherein said at least one retaining element is configured to allow for thermal expansion of the tiles in a direction generally orthogonal to said backing plate.

12. The sputtering assembly of claim 1, wherein said at least one target element is retained at said backing plate via at least one retaining element, and wherein said at least one retaining element and said at least one expansion gap are configured to allow for thermal expansion of the tiles in a direction generally parallel to said backing plate.