Methods of and apparatuses for maintenance, diagnosis, and optimization of processes
First Claim
Patent Images
1. A sensor apparatus for measuring a plasma process parameter for processing a workpiece, the sensor apparatus comprising:
- a base;
an information processor supported by the base; and
a sensor supported by the base, the sensor comprising a sensing element configured for measuring an electrical property of a plasma and a transducer coupled to the sensing element, wherein the transducer is selected from a group consisting of;
a) a transducer configured so as to receive a signal from the sensing element and convert the signal into a second signal for input to the information processor,b) a power transducer having a resistive load for receiving a current and a voltage from the sensing element and a thermometer arranged so as to measure changes in temperature of the resistive load, andc) an optical transducer configured so as to receive a signal from the sensing element and convert the signal into a second signal for input to the information processor, wherein the optical transducer is configured to convert an electrical signal from the sensor element to a light output and a light sensor configured to produce the second signal in proportion to an intensity of the light output that falls on the light sensor.
0 Assignments
0 Petitions
Accused Products
Abstract
A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at least one sensing element configured for measuring an electrical property of a plasma and may include a transducer coupled to the at least one sensing element. The transducer can be configured to receive a signal from the sensing element and convert the signal into a second signal for input to the information processor.
36 Citations
7 Claims
-
1. A sensor apparatus for measuring a plasma process parameter for processing a workpiece, the sensor apparatus comprising:
-
a base; an information processor supported by the base; and a sensor supported by the base, the sensor comprising a sensing element configured for measuring an electrical property of a plasma and a transducer coupled to the sensing element, wherein the transducer is selected from a group consisting of; a) a transducer configured so as to receive a signal from the sensing element and convert the signal into a second signal for input to the information processor, b) a power transducer having a resistive load for receiving a current and a voltage from the sensing element and a thermometer arranged so as to measure changes in temperature of the resistive load, and c) an optical transducer configured so as to receive a signal from the sensing element and convert the signal into a second signal for input to the information processor, wherein the optical transducer is configured to convert an electrical signal from the sensor element to a light output and a light sensor configured to produce the second signal in proportion to an intensity of the light output that falls on the light sensor. - View Dependent Claims (2, 3, 4, 5, 6, 7)
-
Specification