Method for manufacturing a structure with a textured surface for an organic light-emitting diode device, and structure with a textured surface
First Claim
1. A method for manufacturing a structure having a textured surface, comprising a substrate made of mineral glass having a given texture, for an organic-light-emitting-diode device, the method comprising:
- supplying a rough substrate, having a roughness defined by a roughness parameter Ra ranging from 1 to 5 μ
m over an analysis length of 15 mm and with a Gaussian filter having a cut-off frequency of 0.8 mm; and
depositing a liquid-phase silica smoothing film on the substrate, said film being configured to smooth the roughness sufficiently and to form the textured surface of the structure,wherein the textured surface of the structure is defined by a roughness parameter Rdq smaller than 1.5°
, and by a roughness parameter Rmax smaller than 250 nm, over an analysis length of 180 μ
m and with a Gaussian filter having a cut-off frequency of 25 μ
m.
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Abstract
A method for manufacturing a structure having a textured surface, including a substrate made of mineral glass having a given texture, for an organic-light-emitting-diode device, the method including supplying a rough substrate, having a roughness defined by a roughness parameter Ra ranging from 1 to 5 μm over an analysis length of 15 mm and with a Gaussian filter having a cut-off frequency of 0.8 mm; and depositing a liquid-phase silica smoothing film on the substrate, the film being configured to smooth the roughness sufficiently and to form the textured surface of the structure.
47 Citations
16 Claims
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1. A method for manufacturing a structure having a textured surface, comprising a substrate made of mineral glass having a given texture, for an organic-light-emitting-diode device, the method comprising:
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supplying a rough substrate, having a roughness defined by a roughness parameter Ra ranging from 1 to 5 μ
m over an analysis length of 15 mm and with a Gaussian filter having a cut-off frequency of 0.8 mm; anddepositing a liquid-phase silica smoothing film on the substrate, said film being configured to smooth the roughness sufficiently and to form the textured surface of the structure, wherein the textured surface of the structure is defined by a roughness parameter Rdq smaller than 1.5°
, and by a roughness parameter Rmax smaller than 250 nm, over an analysis length of 180 μ
m and with a Gaussian filter having a cut-off frequency of 25 μ
m. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A structure having a textured surface, comprising a rough substrate made of mineral glass of roughness defined by a roughness parameter Ra ranging from 1 to 5 μ
- m over an analysis length of 15 mm and with a Gaussian filter having a cut-off frequency of 0.8 mm, and a silica smoothing film deposited on a surface of the rough substrate to smoothen the surface of the rough substrate, wherein the textured surface of the structure defined by an outer surface of the silica smoothing film is defined by a roughness parameter Rdq smaller than 1.5°
, and by a roughness parameter Rmax smaller than 250 nm, over an analysis length of 180 μ
m, and with a Gaussian filter having a cut-off frequency of 25 μ
m. - View Dependent Claims (8, 9, 11)
- m over an analysis length of 15 mm and with a Gaussian filter having a cut-off frequency of 0.8 mm, and a silica smoothing film deposited on a surface of the rough substrate to smoothen the surface of the rough substrate, wherein the textured surface of the structure defined by an outer surface of the silica smoothing film is defined by a roughness parameter Rdq smaller than 1.5°
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10. An organic-light-emitting-diode device comprising a structure having an external textured surface, the structure comprising a rough substrate made of mineral glass of roughness defined by a roughness parameter Ra ranging from 1 to 5 μ
- m over an analysis length of 15 mm and with a Gaussian filter having a cut-off frequency of 0.8 mm, and a silica smoothing film deposited on a surface of the rough substrate, the textured surface defined by an outer surface of the silica smoothing film being arranged on a side of an organic light-emitting film, under a first electrode underlying the organic light-emitting film,
wherein the textured surface of the structure defined by the outer surface of the silica smoothing film is defined by a roughness parameter Rdq smaller than 1.5°
, and by a roughness parameter Rmax smaller than 250 nm, over an analysis length of 180 μ
m, and with a Gaussian filter having a cut-off frequency of 25 μ
m. - View Dependent Claims (12, 13, 14, 15, 16)
- m over an analysis length of 15 mm and with a Gaussian filter having a cut-off frequency of 0.8 mm, and a silica smoothing film deposited on a surface of the rough substrate, the textured surface defined by an outer surface of the silica smoothing film being arranged on a side of an organic light-emitting film, under a first electrode underlying the organic light-emitting film,
Specification