Electrochromic devices
First Claim
1. A method of fabricating an electro chromic device, the method comprising:
- forming an electrochromic layer comprising an electrochromic material;
forming a counter electrode layer in contact with the electro chromic layer without first providing an ion conducting electronically insulating layer between the electro chromic layer and the counter electrode layer, wherein the counter electrode layer comprises a counter electrode material; and
forming an interfacial region between the electro chromic layer and the counter electrode layer, formed using components of one or both the electrochromic layer and counter electrode layer, wherein said interfacial region is substantially ion conducting and substantially electronically insulating.
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Abstract
Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer. The interfacial region contains an ion conducting electronically insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices.
100 Citations
20 Claims
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1. A method of fabricating an electro chromic device, the method comprising:
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forming an electrochromic layer comprising an electrochromic material; forming a counter electrode layer in contact with the electro chromic layer without first providing an ion conducting electronically insulating layer between the electro chromic layer and the counter electrode layer, wherein the counter electrode layer comprises a counter electrode material; and forming an interfacial region between the electro chromic layer and the counter electrode layer, formed using components of one or both the electrochromic layer and counter electrode layer, wherein said interfacial region is substantially ion conducting and substantially electronically insulating. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A method of fabricating an electro chromic device, the method comprising:
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depositing an electrochromic layer by sputtering a tungsten target with a sputter gas comprising between about 40% and about 80% O2 and between about 20% Ar and about 60% Ar to produce W03 to a thickness of between about 500 nm and about 600 nm, wherein the substrate upon which the W03 is deposited is heated, at least intermittently, to between about 150°
C. and about 450°
C. during formation of the electro chromic layer;sputtering lithium onto the electrochromic layer until the blind charge is satisfied; depositing a counter electrode layer on the electrochromic layer without first providing an ion conducting electronically insulating layer between the electrochromic layer and the counter electrode layer, wherein the counter electrode layer comprises NiWO; sputtering lithium onto the counter electrode layer until the counter electrode layer is substantially bleached; and forming an interfacial region between the electrochromic layer and the counter electrode layer, formed using components of one or both the electrochromic layer and counter electrode layer, wherein said interfacial region is substantially ion conducting and substantially electronically insulating.
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Specification